Extrusion-based additive manufacturing of yttria-partially-stabilized zirconia ceramics

2020 ◽  
Vol 46 (4) ◽  
pp. 5020-5027 ◽  
Author(s):  
Tianyu Yu ◽  
Ziyang Zhang ◽  
Qingyang Liu ◽  
Ruslan Kuliiev ◽  
Nina Orlovskaya ◽  
...  
Keyword(s):  
Additive Manufacturing ◽  
Stabilized Zirconia ◽  
Zirconia Ceramics ◽  
Partially Stabilized Zirconia ◽  
Yttria Partially Stabilized Zirconia

Electrical conductivity of yttria partially stabilized zirconia ceramics

1985 ◽  
Vol 4 (4) ◽  
pp. 467-471 ◽  
Author(s):  
M. Kuwabara ◽  
T. Murakami ◽  
M. Ashizuka ◽  
Y. Kubota ◽  
T. Tsukidate
Keyword(s):  
Electrical Conductivity ◽  
Stabilized Zirconia ◽  
Zirconia Ceramics ◽  
Partially Stabilized Zirconia ◽  
Yttria Partially Stabilized Zirconia

Effect of 64S bioglass addition on sintering kinetic, flexural strength and osteoblast cell response of yttria‐partially stabilized zirconia ceramics

2018 ◽  
Vol 16 (2) ◽  
pp. 517-530 ◽  
Author(s):  
Matías F. Stábile ◽  
Clara G. Soubelet ◽  
María P. Albano ◽  
Adalberto L. Rosa ◽  
Larissa Moreira Spinola de Castro‐Raucci ◽  
...  
Keyword(s):  
Flexural Strength ◽  
Cell Response ◽  
Osteoblast Cell ◽  
Stabilized Zirconia ◽  
Zirconia Ceramics ◽  
Partially Stabilized Zirconia ◽  
Yttria Partially Stabilized Zirconia

Nitriding of yttria-stabilized zirconia in atmospheric pressure microwave plasma

2009 ◽  
Vol 24 (6) ◽  
pp. 2021-2028 ◽  
Author(s):  
R. Milani ◽  
R.P. Cardoso ◽  
T. Belmonte ◽  
C.A. Figueroa ◽  
C.A. Perottoni ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Atmospheric Pressure ◽  
Microwave Plasma ◽  
Plasma Nitriding ◽  
Nitrided Layer ◽  
Zirconium Nitride ◽  
Stabilized Zirconia ◽  
Partially Stabilized Zirconia ◽  
X Ray ◽  
Yttria Partially Stabilized Zirconia

High temperature plasma nitriding of yttria-partially-stabilized zirconia in atmospheric pressure microwave plasma was investigated. The morphological, mechanical, and physicochemical characteristics of the resulting nitrided layer were characterized by different methods, such as optical and scanning electron microscopy, microindentation, x-ray diffraction, narrow resonant nuclear reaction profiling, secondary neutral mass spectrometry, and x-ray photoelectron spectroscopy, aiming at investigating the applicability of this highly efficient process for nitriding of ceramics. The structure of the plasma nitrided layer was found to be complex, composed of tetragonal and cubic zirconia, as well as zirconium nitride and oxynitride. The growth rate of the nitrided layer, 4 µm/min, is much higher than that obtained by any other previous nitriding process, whereas a typical 50% increase in Vickers hardness over that of yttria-partially-stabilized zirconia was observed.

Sign in / Sign up

Export Citation Format

Share Document