Atomic-level stress calculation and surface roughness of film deposition process using molecular dynamics simulation

2010 ◽  
Vol 48 (3) ◽  
pp. 520-528 ◽  
Author(s):  
Zheng-Han Hong ◽  
Shun-Fa Hwang ◽  
Te-Hua Fang
Keyword(s):  
Molecular Dynamics ◽  
Surface Roughness ◽  
Molecular Dynamics Simulation ◽  
Deposition Process ◽  
Atomic Level ◽  
Film Deposition ◽  
Dynamics Simulation ◽  
Stress Calculation

Development in Mechanics Research of Diamond Coatings/WC Interface Based on Molecular Dynamics Simulation

2014 ◽  
Vol 898 ◽  
pp. 41-46
Author(s):  
Xiao Gang Jian ◽  
Yun Hua Zhang
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Adhesive Strength ◽  
Deposition Process ◽  
Dynamics Simulation ◽  
Microscopic Structure ◽  
Diamond Coatings ◽  
Paper Briefly ◽  
Film Substrate ◽  
Important Significance

This paper briefly reviews the overseas and domestic research status of the mechanics of hetero film-substrate interface based on molecular dynamics simulation, on this basis building the accurate model of diamond coatings/WC interface and executing the molecular dynamic simulation, exactly measuring the adhesive strength of the diamond coatings/WC interface, finally exploring the influence of interface scales on the adhesive strength of the diamond coatings/WC interface and verifying the feasibility of studying the microscopic structure by molecular dynamics simulation to characterize the mechanical properties of macrostructure, which has important significance for optimizing deposition process of diamond coatings to improve the adhesive strength of the interface.

Molecular dynamics simulation of the deposition process of cold Ag-clusters under different landing conditions

2014 ◽  
Vol 140 (4) ◽  
pp. 044326 ◽  
Author(s):  
Philipp Thaler ◽  
Alexander Volk ◽  
Martin Ratschek ◽  
Markus Koch ◽  
Wolfgang E. Ernst
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Deposition Process ◽  
Dynamics Simulation ◽  
Ag Clusters

Molecular Dynamics Simulation of the Influence Factors of Particle Depositing on Surface during Cold Spray

2013 ◽  
Vol 652-654 ◽  
pp. 1916-1924 ◽  
Author(s):  
Hong Gao ◽  
Chao Liu ◽  
Fen Hong Song
Keyword(s):  
Molecular Dynamics ◽  
Molecular Dynamics Simulation ◽  
Crystalline Structure ◽  
Influence Factors ◽  
Deposition Process ◽  
Dynamics Simulation ◽  
Effective Combination ◽  
Material Hardness ◽  
Higher Temperature ◽  
Soft Cluster

Using molecular dynamics simulation, the influence factors of deposition process, such as cluster incident velocity, material hardness and so on, were studied. The cluster incident velocity influences the combination strength between the substrate and cluster greatly. The higher the cluster velocity is, the stronger the combination strength is, and the faster the cluster forms the crystalline structure like the substrate. Higher temperature of the substrate and the cluster will improve the combination strength. The size of the cluster influences the effect of combination as well. The larger the cluster is, the stronger the combination strength is. If a soft cluster impacts on a hard substrate, because of lack of enough deformation at the interface of the substrate, it is difficult to form the effective combination. If a hard cluster impacts on a soft substrate, the lattice defects occur and the cluster takes a longer time to form crystalline structure.

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