In situ photoelectron spectroscopic characterization of c-BN films deposited via plasma enhanced chemical vapor deposition employing fluorine chemistry
2015 ◽
Vol 56
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pp. 13-22
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2013 ◽
Vol 44
(10)
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pp. 1393-1397
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1997 ◽
Vol 144
(11)
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pp. 3952-3958
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2013 ◽
Vol 117
(39)
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pp. 9454-9461
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Keyword(s):
1991 ◽
pp. 669-676
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