scholarly journals High quality ion implanted boron emitters in an interdigitated back contact solar cell with 20% efficiency

2011 ◽  
Vol 8 ◽  
pp. 509-514 ◽  
Author(s):  
Nicholas Bateman ◽  
Paul Sullivan ◽  
Christian Reichel ◽  
Jan Benick ◽  
Martin Hermle
Author(s):  
Ajay D. Upadhyaya ◽  
Young Woo Ok ◽  
Elizabeth Chang ◽  
Vijaykumar Upadhyaya ◽  
Keeya Madani ◽  
...  

2016 ◽  
Vol 6 (1) ◽  
pp. 153-158 ◽  
Author(s):  
Ajay D. Upadhyaya ◽  
Young-Woo Ok ◽  
Elizabeth Chang ◽  
Vijaykumar Upadhyaya ◽  
Keeya Madani ◽  
...  

2012 ◽  
Vol 12 (6) ◽  
pp. 1615-1618 ◽  
Author(s):  
Min Gu Kang ◽  
Jong-Han Lee ◽  
Hyunpil Boo ◽  
Sung Ju Tark ◽  
Hae Chul Hwang ◽  
...  

2006 ◽  
Vol 910 ◽  
Author(s):  
Qi Wang ◽  
Matt P. Page ◽  
Eugene Iwancizko ◽  
Yueqin Xu ◽  
Yanfa Yan ◽  
...  

AbstractWe have achieved an independently-confirmed 17.8% conversion efficiency in a 1-cm2, p-type, float-zone silicon (FZ-Si) based heterojunction solar cell. Both the front emitter and back contact are hydrogenated amorphous silicon (a-Si:H) deposited by hot-wire chemical vapor deposition (HWCVD). This is the highest reported efficiency for a HWCVD silicon heterojunction (SHJ) solar cell. Two main improvements lead to our most recent increases in efficiency: 1) the use of textured Si wafers, and 2) the application of a-Si:H heterojunctions on both sides of the cell. Despite the use of textured c-Si to increase the short-circuit current, we were able to maintain the same 0.65 V open-circuit voltage as on flat c-Si. This is achieved by coating a-Si:H conformally on the c-Si surfaces, including covering the tips of the anisotropically-etched pyramids. A brief atomic H treatment before emitter deposition is not necessary on the textured wafers, though it was helpful in the flat wafers. It is essential to high efficiency SHJ solar cells that the emitter grows abruptly as amorphous silicon, instead of as microcrystalline or epitaxial Si. The contact on each side of the cell comprises a thin (< 5 nm) low substrate temperature (~100°C) intrinsic a-Si:H layer, followed by a doped layer. Our intrinsic layers are deposited at 0.3-1.2 nm/s. The doped emitter and back-contact layers were deposited at a higher temperature (>200°C) and grown from PH3/SiH4/H2 and B2H6/SiH4/H2 doping gas mixtures, respectively. This combination of low (intrinsic) and high (doped layer) growth temperatures was optimized by lifetime and surface recombination velocity measurements. Our rapid efficiency advance suggests that HWCVD may have advantages over plasma-enhanced (PE) CVD in fabrication of high-efficiency heterojunction c-Si cells; there is no need for process optimization to avoid plasma damage to the delicate, high-quality, Si wafers.


2021 ◽  
pp. 100092
Author(s):  
Atul Kumar ◽  
Ngangbam Phalguni Singh ◽  
Arunmetha Sundaramoorthy

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