Electrical and optical properties of tantalum oxide thin films prepared by reactive magnetron sputtering

2011 ◽  
Vol 509 (41) ◽  
pp. 9758-9763 ◽  
Author(s):  
A.X. Wei ◽  
Z.X. Ge ◽  
X.H. Zhao ◽  
J. Liu ◽  
Y. Zhao
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Tantalum Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Electrical And Optical Properties

Electrical and optical properties of zinc oxide thin films grown by reactive magnetron sputtering method

2004 ◽  
Vol 109 (1-3) ◽  
pp. 241-244 ◽  
Author(s):  
Kh.A. Abdullin ◽  
A.B. Aimagambetov ◽  
N.B. Beisenkhanov ◽  
A.T. Issova ◽  
B.N. Mukashev ◽  
...  
Keyword(s):  
Thin Films ◽  
Zinc Oxide ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Electrical And Optical Properties

Fabrication and Characterization of Antibacterial Tantalum Oxide Thin Films Deposited by Reactive Magnetron Sputtering

2016 ◽  
Vol 675-676 ◽  
pp. 185-188 ◽  
Author(s):  
Araya Mungchamnankit ◽  
Mati Horprathum ◽  
Chanunthorn Chananonnawathorn ◽  
V. Patthanasettakul ◽  
Pitak Eiamchai ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tantalum Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
Oxide Thin Films ◽  
Structural Morphology ◽  
Atomic Force ◽  
Bk7 Glass

Tantalum oxide (TaO) thin films were deposited by dc reactive magnetron sputtering at room temperature. A target of tantalum (99.995%) and a mixture of argon and oxygen gases were used to deposit TaO films on to silicon wafers (100) and BK7 glass substrate. The effects of annealing temperature (300–700 °C) on structural, morphology and anti-bacterial properties were investigated. Grazing incident X-ray diffraction (GIXRD), atomic force microscope (AFM) measurements are carried out to identify the crystalline structure, film morphology and surface roughness, respectively. The antibacterial behavior of the tantalum oxide thin films will be discussed in this paper.

Effect of O2 Flow Rate on Structural and Optical Properties of Tantalum Oxide Thin Films Prepared by DC Reactive Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 448-451 ◽  
Author(s):  
Narong Sangwaranatee ◽  
Mati Horprathum ◽  
Jakrapong Kaewkhao
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Flow Rate ◽  
Tantalum Oxide ◽  
Oxygen Flow Rate ◽  
Reactive Magnetron Sputtering ◽  
Oxygen Flow ◽  
Reactive Magnetron ◽  
Dc Reactive Magnetron Sputtering

Tantalum oxide (Ta2O5) thin films have been deposited on glass substrates and silicon wafers (100) by dc reactive magnetron sputtering and with a 99.995% pure tantalum target. The effect of the oxygen flow rate on the crystallinity and optical properties were investigated. The films were characterized by X-ray diffraction patterns, UV-Vis spectrophotometer and spectroscopic ellipsometry. The results show that the deposition rate of Ta2O5 thin films was decreased with the increase in oxygen flow rate. In addition, Ta2O5 thin films deposited at oxygen flow rate higher than 6 sccm could be exhibited sufficiently oxide thin film, the transmittance spectrum percentage indicated 80%, which corresponded to the obtained optical characteristic.

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