Fabrication and Characterization of Antibacterial Tantalum Oxide Thin Films Deposited by Reactive Magnetron Sputtering

2016 ◽  
Vol 675-676 ◽  
pp. 185-188 ◽  
Author(s):  
Araya Mungchamnankit ◽  
Mati Horprathum ◽  
Chanunthorn Chananonnawathorn ◽  
V. Patthanasettakul ◽  
Pitak Eiamchai ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Tantalum Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
X Ray Diffraction ◽  
Oxide Thin Films ◽  
Structural Morphology ◽  
Atomic Force ◽  
Bk7 Glass

Tantalum oxide (TaO) thin films were deposited by dc reactive magnetron sputtering at room temperature. A target of tantalum (99.995%) and a mixture of argon and oxygen gases were used to deposit TaO films on to silicon wafers (100) and BK7 glass substrate. The effects of annealing temperature (300–700 °C) on structural, morphology and anti-bacterial properties were investigated. Grazing incident X-ray diffraction (GIXRD), atomic force microscope (AFM) measurements are carried out to identify the crystalline structure, film morphology and surface roughness, respectively. The antibacterial behavior of the tantalum oxide thin films will be discussed in this paper.

W-Doped Vanadium Oxide Thin Films Prepared by Reactive Magnetron Sputtering

2013 ◽  
Vol 652-654 ◽  
pp. 1747-1750
Author(s):  
Shuang Chen ◽  
Li Fang Zhang ◽  
Cui Zhi Dong ◽  
Kuai Zhang ◽  
Xiudong Zhu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
X Ray ◽  
Force Microscopy ◽  
Atomic Force ◽  
Vanadium Oxide Thin Films

W-doped Vanadium oxide thin films were prepared on the substrates of glass and Si (100) by reactive magnetron sputtering after annealing in vacuum. The structure and morphology were characterized by X-ray diffractometer and atomic force microscopy(AFM), respectively. The results show that,when the oxygen volume percent (Po2) increasing from 15% to 25%, the films on the Si(100) were vanadium oxides with high-valences. After vacuum annealing at 500°C for 2h, the major phase of W doped films on glass is VO2. The surface roughness of the film increase for the longer time annealing.

Structure and optical parameters of Eu doped tellurium oxide thin films prepared by reactive magnetron sputtering method

2019 ◽  
Vol 691 ◽  
pp. 137592 ◽  
Author(s):  
Marcin Łapiński ◽  
Michalina Walas ◽  
Anna Gapska ◽  
Dorota Kulik ◽  
Aneta Szmytke ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Optical Parameters ◽  
Reactive Magnetron ◽  
Oxide Thin Films ◽  
Tellurium Oxide
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