Effects of Chemical Etching and Reduction Activation on CO Oxidation of CeO2 Nanorods Supported Ruthenium Catalysts

Author(s):  
Yifan Wang ◽  
Ruigang Wang
Polytechnica ◽  
2020 ◽  
Vol 3 (1-2) ◽  
pp. 26-42
Author(s):  
Subhashish Dey ◽  
Ganesh Chandra Dhal

Author(s):  
M.E. Lee

The crystalline perfection of bulk CdTe substrates plays an important role in their use in infrared device technology. The application of chemical etchants to determine crystal polarity or the density and distribution of crystallographic defects in (100) CdTe is not well understood. The lack of data on (100) CdTe surfaces is a result of the apparent difficulty in growing (100) CdTe single crystal substrates which is caused by a high incidence of twinning. Many etchants have been reported to predict polarity on one or both (111) CdTe planes but are considered to be unsuitable as defect etchants. An etchant reported recently has been considered to be a true defect etchant for CdTe, MCT and CdZnTe substrates. This etchant has been reported to reveal crystalline defects such as dislocations, grain boundaries and inclusions in (110) and (111) CdTe. In this study the effect of this new etchant on (100) CdTe surfaces is investigated.The single crystals used in this study were (100) CdTe as-cut slices (1mm thickness) from Bridgman-grown ingots.


1996 ◽  
Vol 100 (3) ◽  
pp. 1048-1054 ◽  
Author(s):  
Tsuyoshi Sueyoshi ◽  
Takehiko Sasaki ◽  
Yasuhiro Iwasawa

2013 ◽  
Vol 133 (12) ◽  
pp. 642-647 ◽  
Author(s):  
Hitomi Kawakami ◽  
Akinori Zukeran ◽  
Koji Yasumoto ◽  
Yoshiyasu Ehara ◽  
Toshiaki Yamamoto

2004 ◽  
Vol 40 (1) ◽  
pp. 8
Author(s):  
N. Dzyuban ◽  
E. S. Bikbulatov ◽  
E. M. Bikbulatova ◽  
I. A. Kuznetsova

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