Comparison between thermal and plasma enhanced atomic layer deposition processes for the growth of HfO2 dielectric layers
2020 ◽
Vol 539
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pp. 125624
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2012 ◽
Vol 30
(1)
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pp. 01A115
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2020 ◽
Vol 38
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pp. 022602
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2007 ◽
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pp. H90
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2010 ◽
Vol 28
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pp. 1173-1178
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2017 ◽
Vol 4
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pp. 1700231
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2010 ◽
Vol 28
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pp. 77-87
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2020 ◽