Excellent Activity Caused by Dielectric Barrier Discharge (DBD) Plasma Activation for Selective Catalytic Reduction With Propylene (C3H6-SCR): Insight into the Low Temperature Catalytic Behavior of Mn/ZSM-5 Catalysts

2021 ◽  
pp. 107009
Author(s):  
Junqiang Xu ◽  
Tian Tang ◽  
Xiaohong Sheng ◽  
Yanrong Zhang ◽  
Qiang Zhang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Selective Catalytic Reduction ◽  
Barrier Discharge ◽  
Catalytic Reduction ◽  
Dbd Plasma ◽  
Dielectric Barrier ◽  
Catalytic Behavior ◽  
Plasma Activation ◽  
Excellent Activity ◽  
Insight Into

Kinetics of Water Gas Shift Reaction on Au/CeZrO4: A Comparison Between Conventional Heating and Dielectric Barrier Discharge (DBD) Plasma Activation

2020 ◽  
Vol 63 (3-4) ◽  
pp. 363-369 ◽  
Author(s):  
Kanlayawat Wangkawong ◽  
Sukon Phanichphant ◽  
Burapat Inceesungvorn ◽  
Cristina E. Stere ◽  
Sarayute Chansai ◽  
...  
Keyword(s):  
Barrier Discharge ◽  
Water Gas Shift ◽  
Conventional Heating ◽  
Water Gas Shift Reaction ◽  
Dbd Plasma ◽  
Dielectric Barrier ◽  
Plasma Activation ◽  
Shift Reaction ◽  
Water Gas ◽  
Kinetics Of

Research on Low Temperature Anodic Bonding Based on Interface Pretreatment of Dielectric Barrier Discharge Plasma

2015 ◽  
Vol 645-646 ◽  
pp. 356-361
Author(s):  
Ming Qiang Pan ◽  
Lin Ning Sun ◽  
Yang Jun Wang ◽  
Ji Zhu Liu ◽  
Tao Chen ◽  
...  
Keyword(s):  
Low Temperature ◽  
Dielectric Barrier Discharge ◽  
Barrier Discharge ◽  
Bonding Temperature ◽  
Anodic Bonding ◽  
Experimental Result ◽  
Dbd Plasma ◽  
Intimate Contact ◽  
Dielectric Barrier ◽  
Barrier Discharge Plasma

A simple composite bonding that combines dielectric barrier discharge (DBD) plasma activation with anodic bonding has been developed to achieve strong silicon/glass bonding at low temperature. The realization of low temperature bonding is attributed to enhance the hydrophilicity and smooth of silicon and glass surfaces and form lots of free radical after the DBD plasma (including-OH, -H, O, and heat) reacts with the interfaces. And these further reduce the difficulty of chemical bond switching, and improve the speed of the intimate contact formation. The experimental result show that the bonding temperature strongly decreased 100°C by using composite anodic bonding with DBD pretreatment which strength kept constant, and 10MPa bonding strength was obtained at 250°C/900V after the bonding interface was treated for 10s under the conditions of AC1.5KV/25KHz and the clearance 100μm.

scholarly journals Insight into the synergism between MnO2 and acid sites over Mn–SiO2@TiO2 nano-cups for low-temperature selective catalytic reduction of NO with NH3

RSC Advances ◽  
2018 ◽  
Vol 8 (4) ◽  
pp. 1979-1986 ◽  
Author(s):  
Siyi Zheng ◽  
Lei Song ◽  
Siyang Tang ◽  
Changjun Liu ◽  
Hairong Yue ◽  
...  
Keyword(s):  
Low Temperature ◽  
Selective Catalytic Reduction ◽  
Catalytic Reduction ◽  
Acid Sites ◽  
Reduction Of No ◽  
Low Temperature Scr ◽  
Insight Into

A novel Mn–SiO2@TiO2 nano-cup catalyst with synergy of MnO2 and acid sites for efficient low-temperature SCR reaction.

New insight into the promotion effect of Cu doped V2O5/WO3–TiO2 for low temperature NH3-SCR performance

RSC Advances ◽  
2015 ◽  
Vol 5 (44) ◽  
pp. 35155-35165 ◽  
Author(s):  
Meiqing Shen ◽  
Chenxu Li ◽  
Jianqiang Wang ◽  
Lili Xu ◽  
Wulin Wang ◽  
...  
Keyword(s):  
Low Temperature ◽  
Selective Catalytic Reduction ◽  
Catalytic Reduction ◽  
Promotion Effect ◽  
Reduction Of No ◽  
Temperature Range ◽  
Nh3 Scr ◽  
Insight Into

The promotion effect of Cu on the V/WTi catalyst for the selective catalytic reduction of NOx by NH3 was investigated in the temperature range of 150–400 °C.

Sign in / Sign up

Export Citation Format

Share Document