scholarly journals Ferric ion mediated photochemical decomposition of perfluorooctanoic acid (PFOA) by 254nm UV light

2008 ◽  
Vol 160 (1) ◽  
pp. 181-186 ◽  
Author(s):  
Yuan Wang ◽  
Pengyi Zhang ◽  
Gang Pan ◽  
Hao Chen
2010 ◽  
Vol 179 (1-3) ◽  
pp. 1143-1146 ◽  
Author(s):  
M.H. Cao ◽  
B.B. Wang ◽  
H.S. Yu ◽  
L.L. Wang ◽  
S.H. Yuan ◽  
...  

2006 ◽  
Vol 1 (3) ◽  
Author(s):  
Zhang Chaojie ◽  
Zhou Qi ◽  
Chen Ling ◽  
Yuan Yuan ◽  
Zhang Qian

The photo-degradation of perfluorooctanoic acid (PFOA) in aqueous solution was preliminarily studied in this paper in order to develop an effective technique against the pollution of PFOA. Reaction kinetics and factors affecting the degradation were investigated. The results showed that PFOA could be degraded effectively into fluorine ion through UV light irradiation, which was the first example of C-F bond cleavage in PFOA induced by UV light; Ferric ion could promote the photo-degradation efficiency of PFOA in aqueous solutions at pH value 4.0, while adding TiO2 could not increase this photochemical reaction under our experimental condition; The dynamics analysis showed that photodecomposition of PFOA followed a pseudo-zero order reaction. The study indicated that photochemical decomposition was a highly promising technology for the removal of PFOA from wastewater.


2013 ◽  
Vol 2013 (1) ◽  
pp. 000492-000495 ◽  
Author(s):  
Tomoyuki Habu ◽  
Shintaro Yabu ◽  
Kenichi Hirose ◽  
Hiroki Horibe ◽  
Toru Fujinami ◽  
...  

The desmear process of removing via residue after laser drill in substrate manufacturing is a critical step for reliability and electrical performance. Cost effective and environmentally clean desmear processes are industry-wide objectives, as the current wet desmear process results in significant chemical waste and regular bath replacement. Here, we evaluated an effective photo desmear method targeting a low total cost of ownership and negligible environmental impact. This method achieves residue and silica free via bottoms with the use of 172nm vacuum ultraviolet light (VUV) photo-chemical ashing followed by water clean. Studies of organic molecular photochemical decomposition by short wavelength UV light are widely reported and have been applied for purposes such as surface cleaning and improving wettability and are naturally extendable to via residue removal. Scanning electron microscope (SEM) and energy dispersed X-ray spectroscopy (EDX) reveal that the application of VUV desmear results in residue free microvia without negatively affecting via shape or the dielectric surface. In addition, the surface remains highly wettable, which aids downstream copper plating. The high reaction rate, absence of wet chemistry, and creation of surfaces amenable for subsequent copper plating make this dry desmear process a strong candidate for future applications in substrate manufacturing.


1994 ◽  
Vol 13 (3) ◽  
pp. 423-427 ◽  
Author(s):  
Joseph J. Pignatello ◽  
Guadalupe Chapa

2007 ◽  
Vol 4 (4) ◽  
pp. 502-509
Author(s):  
K. N. Mohana ◽  
N. Prasad ◽  
P. M. Ramadas Bhandarkar

The photolysis of dihaloamines (RNX2),viz., dichloramine-B (DCB) and dibromamine-B (DBB) in aqueous acetic acid (1:1 v/v) solutions has been studied with the UV light source (λ= 2537 Å). The experimental rate law obtained is - d [RNX2] / dt = k' Io/ [RNX2], where Iois the intensity of incident light. The addition of benzenesulphonamide, the product of photolysis or uranyl ion had no significant effect on the rate of photochemical decomposition. A slight decrease in the rate has been observed by the addition of NaCl / NaBr to DCB / DBB solutions. The quantum yield (Φ) for the photolytic decomposition has been computed. A suitable photolytic mechanism and a rate law consistent with the observed results have been proposed.


2021 ◽  
Vol 9 ◽  
Author(s):  
Xinyun Yao ◽  
Jiaqi Zuo ◽  
Yu-Jue Wang ◽  
Ning-Ning Song ◽  
Huang-Hao Li ◽  
...  

Perfluorooctanoic acid (PFOA), a typical perfluorinated carboxylic acid, is an emerging type of permanent organic pollutants that are regulated by the Stockholm Convention. The degradation of PFOA, however, is quite challenging largely due to the ultra-high stability of C-F bonds. Compared with other techniques, photocatalytic degradation offers the potential advantages of simple operation under mild conditions as well as exceptional decomposition and defluorination efficiency. Titanium dioxide (TiO2) is one of the most frequently used photocatalysts, but so far, the pristine nanosized TiO2 (e.g., the commercial P25) has been considered inefficient for PFOA degradation, since the photo-generated hydroxyl radicals from TiO2 are not able to directly attack C-F bonds. Mesoporous Sb2O3/TiO2 heterojunctions were therefore rationally designed in this work, of which the confined Sb2O3 nanoparticles in mesoporous TiO2 framework could not only tune the band structure and also increase the number of active sites for PFOA degradation. It was found that, after loading Sb2O3, the absorption of UV light was enhanced, indicating a higher efficiency of light utilization; while the band gap was reduced, which accelerated the separation of photo-generated charge carriers; and most importantly, the valence band edge of the Sb2O3/TiO2 heterojunction was significantly lifted so as to prevent the occurrence of hydroxyl radical pathway. Under the optimal ratio of Sb2O3–TiO2, the resulting catalysts managed to remove 81.7% PFOA in 2 h, with a degradation kinetics 4.2 times faster than the commercial P25. Scavenger tests and electron spin resonance spectra further revealed that such improvement was mainly attributed to the formation of superoxide radicals and photo-generated holes, in which the former drove the decarboxylation from C7F15COOH–C7F15•, and the latter promoted the direct electron transfer for the conversion of C7F15COO−–C7F15COO•. The Sb2O3/TiO2 photocatalysts were highly recyclable, with nearly 90% of the initial activity being retained after five consecutive cycles, guaranteeing the feasibility of long-term operation.


2012 ◽  
Vol 10 (2) ◽  
pp. 129-140 ◽  
Author(s):  
Masaki OHNO ◽  
Yuta KUBO ◽  
Esteban R Mino A ◽  
Tomohiro KOSE ◽  
Satoshi NAKAI ◽  
...  

2014 ◽  
Vol 268 ◽  
pp. 150-155 ◽  
Author(s):  
Masaki Ohno ◽  
Masataka Ito ◽  
Ryouichi Ohkura ◽  
Esteban R. Mino A ◽  
Tomohiro Kose ◽  
...  

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