Structure and magnetic properties of FeCo nanoparticles encapsulated in carbon nanotubes grown by microwave plasma enhanced chemical vapor deposition

In this paper, we synthesize carbon nanotubes (CNTs) by using atmospheric pressure microwave plasma chemical vapor deposition (AMPCVD). In AMPCVD, a coaxial plasma generator provides 200 W 2.45 GHz microwave plasma at atmospheric pressure to decompose the precursor. A high-temperature tube furnace provides a suitable growth temperature for the deposition of CNTs. Optical fiber spectroscopy was used to measure the compositions of the argon–ethanol–hydrogen plasma. A comparative experiment of ethanol precursor decomposition, with and without plasma, was carried out to measure the role of the microwave plasma, showing that the 200 W microwave plasma can decompose 99% of ethanol precursor at any furnace temperature. CNTs were prepared on a stainless steel substrate by using the technology to decompose ethanol with the plasma power of 200 W at the temperatures of 500, 600, 700, and 800 °C; CNT growth increases with the increase in temperature. Prepared CNTs, analyzed by SEM and HRTEM, were shown to be multiwalled and tangled with each other. The measurement of XPS and Raman spectroscopy indicates that many oxygenated functional groups have attached to the surface of the CNTs.

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Growth of Carbon Nanotubes at Low Powers by Impedance-Matched Microwave Plasma Enhanced Chemical Vapor Deposition Method

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2005.437 ◽

2005 ◽

Vol 5 (11) ◽

pp. 1887-1892 ◽

Cited By ~ 2

Author(s):

S. Y. Chen ◽

L. W. Chang ◽

C. W. Peng ◽

H. Y. Miao ◽

Juh-Tzeng Lue

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method

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Encapsluation of Co and Pd multi-metal nanowires inside multiwalled carbon nanotubes by microwave plasma chemical vapor deposition

Diamond and Related Materials ◽

10.1016/j.diamond.2006.11.039 ◽

2007 ◽

Vol 16 (4-7) ◽

pp. 1200-1203 ◽

Cited By ~ 13

Author(s):

Yasuhiko Hayashi ◽

T. Fujita ◽

T. Tokunaga ◽

K. Kaneko ◽

T. Butler ◽

...

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Multiwalled Carbon Nanotubes ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Metal Nanowires ◽

Plasma Chemical ◽

Multiwalled Carbon ◽

Plasma Chemical Vapor Deposition

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Aligned Carbon Nanotubes Via Microwave Plasma Enhanced Chemical Vapor Deposition

MRS Proceedings ◽

10.1557/proc-593-39 ◽

1999 ◽

Vol 593 ◽

Cited By ~ 1

Author(s):

H. Cui ◽

D. Palmer ◽

O. Zhou ◽

B. R. Stoner

Keyword(s):

Electron Microscopy ◽

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Silicon Substrates ◽

Multi Wall Carbon Nanotubes ◽

Field Emission Properties ◽

Transmission Electron

ABSTRACTAligned multi-wall carbon nanotubes have been grown on silicon substrates by microwave plasma enhanced chemical vapor deposition using methane/ammonia mixtures. The concentration ratio of methane/ammonia in addition to substrate temperature was varied. The morphology, structure and alignment of carbon nanotubes were studied by scanning electron microscopy and transmission electron microscopy. Both concentric hollow and bamboo-type multi-wall carbon nanotubes were observed. Growth rate, size distribution, alignment, morphology, and structure of carbon nanotubes changed with methane/ammonia ratio and growth temperature. Preliminary results on field emission properties are also presented.

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