Synthesis of iron oxide films by reactive magnetron sputtering assisted by plasma emission monitoring

Materials Chemistry and Physics ◽

10.1016/j.matchemphys.2018.11.010 ◽

2019 ◽

Vol 223 ◽

pp. 360-365 ◽

Author(s):

E. Aubry ◽

T. Liu ◽

A. Dekens ◽

F. Perry ◽

S. Mangin ◽

...

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Plasma Emission ◽

Reactive Magnetron ◽

Emission Monitoring ◽

Iron Oxide Films

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Synthesis and characterization of La 2 NiO 4+δ coatings deposited by reactive magnetron sputtering using plasma emission monitoring

Solid State Ionics ◽

10.1016/j.ssi.2014.07.017 ◽

2014 ◽

Vol 265 ◽

pp. 73-79 ◽

Author(s):

J. Fondard ◽

A. Billard ◽

G. Bertrand ◽

P. Briois

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Synthesis And Characterization ◽

Plasma Emission ◽

Reactive Magnetron ◽

Emission Monitoring

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High rate deposition of tin-doped indium oxide films by reactive magnetron sputtering with unipolar pulsing and plasma emission feedback systems

Science and Technology of Advanced Materials ◽

10.1016/j.stam.2005.11.005 ◽

2006 ◽

Vol 7 (1) ◽

pp. 56-61 ◽

Author(s):

S. Ohno ◽

Y. Kawaguchi ◽

A. Miyamura ◽

Y. Sato ◽

P.K. Song ◽

...

Keyword(s):

Magnetron Sputtering ◽

Indium Oxide ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

High Rate ◽

Plasma Emission ◽

Reactive Magnetron ◽

Feedback Systems ◽

Indium Oxide Films

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Practical aspects for the use of plasma emission monitoring in reactive magnetron sputtering processes

Vacuum ◽

10.1016/0042-207x(94)90078-7 ◽

1994 ◽

Vol 45 (12) ◽

pp. 1181-1186 ◽

Author(s):

CD Tsiogas ◽

JN Avaritsiotis ◽

CA Kagarakis

Keyword(s):

Magnetron Sputtering ◽

Reactive Magnetron Sputtering ◽

Plasma Emission ◽

Reactive Magnetron ◽

Emission Monitoring

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Effect of total pressure on La 2 NiO 4 coatings deposited by reactive magnetron sputtering using plasma emission monitoring

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2015.11.053 ◽

2016 ◽

Vol 295 ◽

pp. 29-36 ◽

Author(s):

J. Fondard ◽

A. Billard ◽

G. Bertrand ◽

S. Fourcade ◽

P. Batocchi ◽

...

Keyword(s):

Magnetron Sputtering ◽

Total Pressure ◽

Reactive Magnetron Sputtering ◽

Plasma Emission ◽

Reactive Magnetron ◽

Emission Monitoring

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Reactive magnetron sputtering of transparent and conductive zinc oxide films deposited at high rates onto CIS/CIGS photovoltaic devices

Conference Record of the Twenty Sixth IEEE Photovoltaic Specialists Conference - 1997 ◽

10.1109/pvsc.1997.654134 ◽

2002 ◽

Author(s):

T.J. Gillespie ◽

W.A. Miles ◽

J.A. del Cueto

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Photovoltaic Devices ◽

Zinc Oxide Films

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Study of annealed indium tin oxide films prepared by rf reactive magnetron sputtering

Vacuum ◽

10.1016/0042-207x(94)00150-2 ◽

1995 ◽

Vol 46 (7) ◽

pp. 673-680 ◽

Author(s):

Li-jian Meng ◽

A Maçarico ◽

R Martins

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tin Oxide Films

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Ion bombardment-induced enhancement of the properties of indium tin oxide films prepared by plasma-assisted reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.01.012 ◽

2009 ◽

Vol 517 (16) ◽

pp. 4576-4582 ◽

Author(s):

M. Dudek ◽

A. Amassian ◽

O. Zabeida ◽

J.E. Klemberg-Sapieha ◽

L. Martinu

Keyword(s):

Magnetron Sputtering ◽

Tin Oxide ◽

Indium Tin Oxide ◽

Oxide Films ◽

Ion Bombardment ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Tin Oxide Films

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Preparation and properties of nitrogen doped p-type zinc oxide films by reactive magnetron sputtering

Vacuum ◽

10.1016/j.vacuum.2013.10.001 ◽

2014 ◽

Vol 101 ◽

pp. 313-316 ◽

Author(s):

ZhanWu Wang ◽

Yonggao Yue ◽

Yan Cao

Keyword(s):

Magnetron Sputtering ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Nitrogen Doped ◽

Zinc Oxide Films ◽

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Fabrication of low phase transition temperature vanadium oxide films by direct current reactive magnetron sputtering and oxidation post-anneal method

Infrared Physics & Technology ◽

10.1016/j.infrared.2014.07.016 ◽

2014 ◽

Vol 67 ◽

pp. 126-130 ◽

Author(s):

Ya Qiao ◽

Jie Chen ◽

Yuan Lu ◽

Xing Yang ◽

Hua Yang ◽

...

Keyword(s):

Phase Transition ◽

Transition Temperature ◽

Magnetron Sputtering ◽

Vanadium Oxide ◽

Phase Transition Temperature ◽

Direct Current ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Vanadium Oxide Films

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Raman spectroscopy of copper oxide films deposited by reactive magnetron sputtering

Technical Physics Letters ◽

10.1134/s106378501511022x ◽

2015 ◽

Vol 41 (11) ◽

pp. 1094-1096 ◽

Author(s):

V. S. Levitskii ◽

V. I. Shapovalov ◽

A. E. Komlev ◽

A. V. Zav’yalov ◽

V. V. Vit’ko ◽

...

Keyword(s):

Raman Spectroscopy ◽

Magnetron Sputtering ◽

Copper Oxide ◽

Oxide Films ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron

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