scholarly journals Thio-olivine Mn2SiS4 thin films by reactive magnetron sputtering: Structural and optical properties with insights from first principles calculations

2018 ◽  
Vol 152 ◽  
pp. 110-118 ◽  
Author(s):  
A. Davydova ◽  
J. Eriksson ◽  
R. Chen ◽  
K. Rudisch ◽  
C. Persson ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
First Principles ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
First Principles Calculations ◽  
Structural And Optical Properties

Influence of Sputtering Power on Structural and Optical Properties of Ta2O5 Thin Films Prepared by DC Reactive Magnetron Sputtering

2014 ◽  
Vol 979 ◽  
pp. 431-434 ◽  
Author(s):  
Narong Sangwaranatee ◽  
Mati Horprathum ◽  
Jakrapong Kaewkhao
Keyword(s):  
Thin Films ◽  
Growth Rate ◽  
Optical Properties ◽  
Magnetron Sputtering ◽  
Maximum Growth ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Structural And Optical Properties ◽  
Sputtering Power ◽  
Dc Reactive Magnetron Sputtering

In this article, amorphous tantalum oxide thin films were deposited by dc reactive magnetron sputtering onto silicon (001) wafer and glass slide substrates. Sputtering power has been varied for optimizing thin film quality. The structural and optical properties of the Ta2O5 thin films were investigated by using X-ray diffraction, UV-Vis spectrophotometer and spectroscopic ellipsometry respectively. The XRD pattern result indicates that the films are amorphous. It was found that the growth rate was also increased with increasing dc power up to 250 W, and the maximum growth rate observed at 250 W was 0.25 nm/s. In addition, the refractive index and packing density of the films increases with increasing dc sputtering power.

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