Influence of Sputtering Power on Structural and Optical Properties of Ta2O5 Thin Films Prepared by DC Reactive Magnetron Sputtering
2014 ◽
Vol 979
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pp. 431-434
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Keyword(s):
In this article, amorphous tantalum oxide thin films were deposited by dc reactive magnetron sputtering onto silicon (001) wafer and glass slide substrates. Sputtering power has been varied for optimizing thin film quality. The structural and optical properties of the Ta2O5 thin films were investigated by using X-ray diffraction, UV-Vis spectrophotometer and spectroscopic ellipsometry respectively. The XRD pattern result indicates that the films are amorphous. It was found that the growth rate was also increased with increasing dc power up to 250 W, and the maximum growth rate observed at 250 W was 0.25 nm/s. In addition, the refractive index and packing density of the films increases with increasing dc sputtering power.
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