Low-Temperature Deposition of Photocatalyst CuAl2O4 Thin Film by Ultrasonic Spray Pyrolysis

2021 ◽  
pp. 131620
Author(s):  
Iping Suhariadi ◽  
Yudi Rahmawan ◽  
Diva A.M. Muyassiroh ◽  
Muhammad A. Barrinaya ◽  
Jaka F. Fatriansyah
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Spray Pyrolysis ◽  
Ultrasonic Spray Pyrolysis ◽  
Ultrasonic Spray ◽  
Low Temperature Deposition ◽  
Temperature Deposition

Indium Oxide Thin-Film Transistors Processed at Low Temperature via Ultrasonic Spray Pyrolysis

2014 ◽  
Vol 7 (1) ◽  
pp. 782-790 ◽  
Author(s):  
Hendrik Faber ◽  
Yen-Hung Lin ◽  
Stuart R. Thomas ◽  
Kui Zhao ◽  
Nikos Pliatsikas ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
Spray Pyrolysis ◽  
Indium Oxide ◽  
Thin Film Transistors ◽  
Ultrasonic Spray Pyrolysis ◽  
Oxide Thin Film ◽  
Ultrasonic Spray ◽  
Indium Oxide Thin Film

Crystal growth in the low-temperature deposition of polycrystalline silicon thin film

2005 ◽  
Vol 274 (3-4) ◽  
pp. 347-354
Author(s):  
Seung-Doh Shin ◽  
Dong-Wan Kim ◽  
Dong-Ik Kim ◽  
Doh-Yeon Kim
Keyword(s):  
Thin Film ◽  
Crystal Growth ◽  
Low Temperature ◽  
Polycrystalline Silicon ◽  
Silicon Thin Film ◽  
Low Temperature Deposition ◽  
Temperature Deposition

scholarly journals Photocatalytic Degradation of Different VOCs in the Gas-Phase over TiO2 Thin Films Prepared by Ultrasonic Spray Pyrolysis

Catalysts ◽  
2019 ◽  
Vol 9 (11) ◽  
pp. 915 ◽  
Author(s):  
Ibrahim Dundar ◽  
Marina Krichevskaya ◽  
Atanas Katerski ◽  
Malle Krunks ◽  
Ilona Oja Acik
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Photocatalytic Degradation ◽  
Spray Pyrolysis ◽  
Tio2 Thin Film ◽  
Ultrasonic Spray Pyrolysis ◽  
Airflow Rate ◽  
Tio2 Films ◽  
Tio2 Thin Films ◽  
Ultrasonic Spray

In this study, we deposited TiO2 thin films onto borosilicate glass by ultrasonic spray pyrolysis at 350 and 450 °C. The aim of study is to determine the effect of deposition temperature on photocatalytic activity of TiO2 thin films and to investigate the performance of TiO2 thin films on photocatalytic degradation of methyl tert-butyl ether (MTBE), acetone, acetaldehyde, and heptane as functions of different operating parameters. TiO2 thin films deposited at 350 and 450 °C have a thickness value of 190 and 330 nm, respectively. All as-prepared TiO2 films possess an anatase crystalline structure. According to the X-ray photon spectroscopy (XPS) study, the TiO2 thin film deposited at 350 °C showed a higher amount of oxygen vacancies and hydroxyl groups on the film surface after UV treatment. The aged-TiO2 thin film deposited at 350 °C showed a water contact angle (WCA) value of 0° after 10 min UV irradiation, showing superhydrophilic surface behavior. The TiO2 film deposited at 350 °C exhibited the highest amount of conversion of MTBE (100%). The results also showed that TiO2 films are capable of photocatalytic degradation of MTBE (100%) and acetaldehyde (approx. 80%) in humid air conditions and high airflow rate. The visible-light-activity of TiO2 thin films was tested with 5 ppm MTBE and acetone. TiO2 thin films deposited at 350 °C with a surface area of 600 cm2 showed 60% of MTBE and 33% of acetone degradation under VIS light.

Double-layer indium doped zinc oxide for silicon thin-film solar cell prepared by ultrasonic spray pyrolysis

2011 ◽  
Vol 20 (3) ◽  
pp. 037306 ◽  
Author(s):  
Bao-Chen Jiao ◽  
Xiao-Dan Zhang ◽  
Chang-Chun Wei ◽  
Jian Sun ◽  
Jian Ni ◽  
...  
Keyword(s):  
Thin Film ◽  
Zinc Oxide ◽  
Solar Cell ◽  
Spray Pyrolysis ◽  
Double Layer ◽  
Thin Film Solar Cell ◽  
Ultrasonic Spray Pyrolysis ◽  
Silicon Thin Film ◽  
Ultrasonic Spray

Technique for High-Rate, Low-Temperature Deposition of TiO2Photocatalytic Thin Film Using Radical-Assisted Sputtering

2011 ◽  
Vol 50 (1R) ◽  
pp. 010204 ◽  
Author(s):  
Daisuke Noguchi ◽  
Tomohiro Eto ◽  
Kazuya Kodama ◽  
Yukie Higashimaru ◽  
Shoji Fukudome ◽  
...  
Keyword(s):  
Thin Film ◽  
Low Temperature ◽  
High Rate ◽  
Low Temperature Deposition ◽  
Temperature Deposition

CdTe thin film solar cells prepared by a low-temperature deposition method

2009 ◽  
Vol 207 (3) ◽  
pp. 730-733 ◽  
Author(s):  
V. D. Novruzov ◽  
N. M. Fathi ◽  
O. Gorur ◽  
M. Tomakin ◽  
A. I. Bayramov ◽  
...  
Keyword(s):  
Thin Film ◽  
Solar Cells ◽  
Low Temperature ◽  
Thin Film Solar Cells ◽  
Cdte Thin Film ◽  
Deposition Method ◽  
Low Temperature Deposition ◽  
Temperature Deposition
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