Study the influence of deposition parameter on structure & wettability properties of chromium oxide coating deposited by reactive RF magnetron sputtering on GFRP composite

Materials Today Proceedings ◽

10.1016/j.matpr.2021.10.253 ◽

2021 ◽

Author(s):

Mihir H. Amin ◽

Kishan D. Patel ◽

Nachiket A. Patel ◽

Dhruvish Y. Patel ◽

Kamlesh V. Chauhan

Keyword(s):

Magnetron Sputtering ◽

Chromium Oxide ◽

Oxide Coating ◽

Rf Magnetron Sputtering ◽

Deposition Parameter ◽

Gfrp Composite ◽

Reactive Rf Magnetron Sputtering

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Thermal annealing effect on zinc nitride thin films deposited by reactive rf-magnetron sputtering process

Materials Science in Semiconductor Processing ◽

10.1016/j.mssp.2012.10.004 ◽

2013 ◽

Vol 16 (2) ◽

pp. 318-325 ◽

Cited By ~ 10

Author(s):

Ting Wen ◽

Madhav Gautam ◽

Amir M. Soleimanpour ◽

Ahalapitiya H. Jayatissa

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Thermal Annealing ◽

Rf Magnetron Sputtering ◽

Annealing Effect ◽

Zinc Nitride ◽

Reactive Rf Magnetron Sputtering

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Structural and optical characterization of Cu3N films prepared by reactive RF magnetron sputtering

Journal of Crystal Growth ◽

10.1016/s0022-0248(00)00968-4 ◽

2001 ◽

Vol 222 (4) ◽

pp. 767-772 ◽

Cited By ~ 98

Author(s):

Kwang Joo Kim ◽

Jong Hyuk Kim ◽

Ji Hoon Kang

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Optical Characterization ◽

Reactive Rf Magnetron Sputtering

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Improving the electrical and optical properties of CuCrO2 thin film deposited by reactive RF magnetron sputtering in controlled N2/Ar atmosphere

Applied Physics A ◽

10.1007/s00339-018-1945-2 ◽

2018 ◽

Vol 124 (8) ◽

Cited By ~ 6

Author(s):

Morteza Ahmadi ◽

Morteza Asemi ◽

Majid Ghanaatshoar

Keyword(s):

Thin Film ◽

Optical Properties ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Electrical And Optical Properties ◽

Reactive Rf Magnetron Sputtering

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Preparation of Conductive LaNiO3 Thin Films by Using Reactive RF Magnetron Sputtering with La and Ni Metals

Journal of the Korean Physical Society ◽

10.3938/jkps.43.847 ◽

2003 ◽

Vol 43 (5) ◽

pp. 847-849 ◽

Cited By ~ 7

Author(s):

Heesan Kim ◽

Jai-Hyun Kim ◽

Woong Kil Choo

Keyword(s):

Thin Films ◽

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Reactive Rf Magnetron Sputtering

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Stress in NbCxN1-xFilms Prepared by Reactive Rf Magnetron Sputtering

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l834 ◽

1993 ◽

Vol 32 (Part 2, No. 6B) ◽

pp. L834-L836 ◽

Cited By ~ 8

Author(s):

Shogo Kiryu ◽

Akira Shoji ◽

Satoshi Kohjiro ◽

Shinji Kodaira

Keyword(s):

Magnetron Sputtering ◽

Rf Magnetron Sputtering ◽

Reactive Rf Magnetron Sputtering

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Optical, morphological and nano-mechanical properties of chromium oxide thin films fabricated by radio frequency (RF) magnetron sputtering

Optik ◽

10.1016/j.ijleo.2019.163433 ◽

2020 ◽

Vol 201 ◽

pp. 163433 ◽

Cited By ~ 1

Author(s):

Soner Özen ◽

Volkan Şenay

Keyword(s):

Thin Films ◽

Mechanical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Chromium Oxide ◽

Rf Magnetron Sputtering ◽

Oxide Thin Films

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Effects of silicon content on the structure and mechanical properties of (AlCrTaTiZr)–Six–N coatings by reactive RF magnetron sputtering

Journal of Physics D Applied Physics ◽

10.1088/0022-3727/44/20/205405 ◽

2011 ◽

Vol 44 (20) ◽

pp. 205405 ◽

Cited By ~ 16

Author(s):

Keng-Hao Cheng ◽

Che-Wei Tsai ◽

Su-Jien Lin ◽

Jien-Wei Yeh

Keyword(s):

Mechanical Properties ◽

Magnetron Sputtering ◽

Silicon Content ◽

Rf Magnetron Sputtering ◽

Reactive Rf Magnetron Sputtering

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Optical band gap of zinc nitride films prepared on quartz substrates from a zinc nitride target by reactive rf magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2005.10.006 ◽

2006 ◽

Vol 252 (22) ◽

pp. 7983-7986 ◽

Cited By ~ 43

Author(s):

Fujian Zong ◽

Honglei Ma ◽

Wei Du ◽

Jin Ma ◽

Xijian Zhang ◽

...

Keyword(s):

Magnetron Sputtering ◽

Band Gap ◽

Optical Band Gap ◽

Rf Magnetron Sputtering ◽

Zinc Nitride ◽

Quartz Substrates ◽

Reactive Rf Magnetron Sputtering

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Effects of nitrogen partial pressure on titanium oxynitride films deposited by reactive RF magnetron sputtering onto PET substrates

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2008.06.066 ◽

2008 ◽

Vol 202 (22-23) ◽

pp. 5440-5443 ◽

Cited By ~ 5

Author(s):

M.C. Lin ◽

L.-S. Chang ◽

H.C. Lin

Keyword(s):

Magnetron Sputtering ◽

Partial Pressure ◽

Rf Magnetron Sputtering ◽

Nitrogen Partial Pressure ◽

Reactive Rf Magnetron Sputtering

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X-Ray Photoelectron Spectroscopy and Raman Spectroscopy Studies on Thin Carbon Nitride Films Deposited by Reactive RF Magnetron Sputtering

World Journal of Nano Science and Engineering ◽

10.4236/wjnse.2012.22012 ◽

2012 ◽

Vol 02 (02) ◽

pp. 92-102 ◽

Cited By ~ 26

Author(s):

Masao Matsuoka ◽

Sadao Isotani ◽

Ronaldo D. Mansano ◽

Wilmer Sucasaire ◽

Ricardo A. C. Pinto ◽

...

Keyword(s):

Raman Spectroscopy ◽

Magnetron Sputtering ◽

Photoelectron Spectroscopy ◽

Carbon Nitride ◽

Rf Magnetron Sputtering ◽

X Ray ◽

Thin Carbon ◽

Spectroscopy Studies ◽

Reactive Rf Magnetron Sputtering

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