Approach of enhancing exposure depth for evanescent wave interference lithography
2010 ◽
Vol 87
(5-8)
◽
pp. 1168-1171
◽
2006 ◽
Vol 8
(4)
◽
pp. S213-S218
◽
Keyword(s):
2004 ◽
Vol 21
(5)
◽
pp. 907-910
◽
Keyword(s):