Design and development of low activation energy based nonchemically amplified resists (n-CARs) for next generation EUV lithography
2016 ◽
Vol 164
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pp. 115-122
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Keyword(s):
2008 ◽
Vol 16
(3)
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pp. 26-28
2021 ◽
Vol 55
(5)
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pp. 407-418
2005 ◽
Vol 18
(2)
◽
pp. 101-125
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Keyword(s):
2007 ◽
Vol 20
(3)
◽
pp. 437-444
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