Observation and characterization of defects in HfO2 high-K gate dielectric layers

2005 ◽  
Vol 45 (5-6) ◽  
pp. 798-801 ◽  
Author(s):  
Vidya Kaushik ◽  
Martine Claes ◽  
Annelies Delabie ◽  
Sven Van Elshocht ◽  
Olivier Richard ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Dielectric Layers ◽  
High K ◽  
High K Gate Dielectric

Characterization of high-k gate dielectric/silicon interfaces

2002 ◽  
Vol 190 (1-4) ◽  
pp. 66-74 ◽  
Author(s):  
Seiichi Miyazaki
Keyword(s):  
Gate Dielectric ◽  
High K ◽  
High K Gate Dielectric

Characterization of high-k gate dielectric films using SIMS

2003 ◽  
Vol 203-204 ◽  
pp. 516-519 ◽  
Author(s):  
T. Yamamoto ◽  
N. Morita ◽  
N. Sugiyama ◽  
A. Karen ◽  
K. Okuno
Keyword(s):  
Gate Dielectric ◽  
Dielectric Films ◽  
High K ◽  
High K Gate Dielectric

Effective electrical passivation of Ge(100) for high-k gate dielectric layers using germanium oxide

2007 ◽  
Vol 91 (8) ◽  
pp. 082904 ◽  
Author(s):  
Annelies Delabie ◽  
Florence Bellenger ◽  
Michel Houssa ◽  
Thierry Conard ◽  
Sven Van Elshocht ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Germanium Oxide ◽  
Dielectric Layers ◽  
High K ◽  
High K Gate Dielectric

Characterization of ALD Beryllium Oxide as a Potential High-k Gate Dielectric for Low-Leakage AlGaN/GaN MOSHEMTs

2013 ◽  
Vol 43 (1) ◽  
pp. 151-154 ◽  
Author(s):  
Derek W. Johnson ◽  
Jung Hwan Yum ◽  
Todd W. Hudnall ◽  
Ryan M. Mushinski ◽  
Christopher W. Bielawski ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Beryllium Oxide ◽  
Low Leakage ◽  
High K ◽  
High K Gate Dielectric

Characterization of High-k Gate Dielectric with Amorphous Nanostructure

2013 ◽  
Vol 42 (12) ◽  
pp. 3529-3540 ◽  
Author(s):  
Ali Bahari ◽  
Reza Gholipur
Keyword(s):  
Gate Dielectric ◽  
High K ◽  
High K Gate Dielectric

Growth and characterization of Hf–aluminate high-k gate dielectric ultrathin films with equivalent oxide thickness less than 10 Å

2003 ◽  
Vol 93 (6) ◽  
pp. 3665-3667 ◽  
Author(s):  
P. F. Lee ◽  
J. Y. Dai ◽  
K. H. Wong ◽  
H. L. W. Chan ◽  
C. L. Choy
Keyword(s):  
Ultrathin Films ◽  
Gate Dielectric ◽  
Oxide Thickness ◽  
Equivalent Oxide Thickness ◽  
High K ◽  
High K Gate Dielectric

Electrical Characterization of Capacitors with AVD-Deposited Hafnium Silicates as High-k Gate Dielectric

2005 ◽  
Vol 152 (11) ◽  
pp. F185 ◽  
Author(s):  
S. Van Elshocht ◽  
U. Weber ◽  
T. Conard ◽  
V. Kaushik ◽  
M. Houssa ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Electrical Characterization ◽  
High K ◽  
High K Gate Dielectric

Characterization of high-k gate dielectric and metal gate electrode semiconductor samples with a total reflection X-ray fluorescence spectrometer

2004 ◽  
Vol 59 (8) ◽  
pp. 1227-1234 ◽  
Author(s):  
Chris M. Sparks ◽  
Meredith R. Beebe ◽  
Joe Bennett ◽  
Brendan Foran ◽  
Carolyn Gondran ◽  
...  
Keyword(s):  
Gate Dielectric ◽  
Total Reflection ◽  
Gate Electrode ◽  
Metal Gate ◽  
X Ray ◽  
High K ◽  
Fluorescence Spectrometer ◽  
High K Gate Dielectric
Sign in / Sign up

Export Citation Format

Share Document