Growth and characterization of HfO2 high-k gate dielectric films by laser molecular beam epitaxy (LMBE)

2006 ◽  
Vol 17 (9) ◽  
pp. 685-688 ◽  
Author(s):  
Y. K. Lu ◽  
X. F. Chen ◽  
W. Zhu ◽  
R. Gopalkrishnan
Keyword(s):  
Molecular Beam Epitaxy ◽  
Molecular Beam ◽  
Gate Dielectric ◽  
Dielectric Films ◽  
Laser Molecular Beam Epitaxy ◽  
High K ◽  
High K Gate Dielectric

Characterization of high-k gate dielectric films using SIMS

2003 ◽  
Vol 203-204 ◽  
pp. 516-519 ◽  
Author(s):  
T. Yamamoto ◽  
N. Morita ◽  
N. Sugiyama ◽  
A. Karen ◽  
K. Okuno
Keyword(s):  
Gate Dielectric ◽  
Dielectric Films ◽  
High K ◽  
High K Gate Dielectric

scholarly journals Fabrication and properties of the Y-doped Al2O3 high-k gate dielectric films

2005 ◽  
Vol 54 (12) ◽  
pp. 5901
Author(s):  
Guo De-Feng ◽  
Geng Wei-Gang ◽  
Lan Wei ◽  
Huang Chun-Ming ◽  
Wang Yin-Yue
Keyword(s):  
Gate Dielectric ◽  
Dielectric Films ◽  
High K ◽  
High K Gate Dielectric

scholarly journals Epitaxial growth and characterization of CuGa2O4 films by laser molecular beam epitaxy

AIP Advances ◽  
2017 ◽  
Vol 7 (11) ◽  
pp. 115216 ◽  
Author(s):  
Hongling Wei ◽  
Zhengwei Chen ◽  
Zhenping Wu ◽  
Wei Cui ◽  
Yuanqi Huang ◽  
...  
Keyword(s):  
Molecular Beam Epitaxy ◽  
Epitaxial Growth ◽  
Molecular Beam ◽  
Laser Molecular Beam Epitaxy

scholarly journals High-k Gate Dielectric Films Studied by Extremely Asymmetric X-ray Diffraction and X-ray Photoelectron Spectroscopy

2007 ◽  
Vol 83 ◽  
pp. 012011 ◽  
Author(s):  
Yuki Ito ◽  
Koichi Akimoto ◽  
Hironori Yoshida ◽  
Takashi Emoto ◽  
Daisuke Kobayashi ◽  
...  
Keyword(s):  
Photoelectron Spectroscopy ◽  
Gate Dielectric ◽  
Dielectric Films ◽  
X Ray Diffraction ◽  
X Ray ◽  
High K ◽  
High K Gate Dielectric
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