Improvement of light extraction for AlGaN-based near UV LEDs with flip-chip bonding fabricated on grooved sapphire substrate using laser ablation

2019 ◽  
Vol 95 ◽  
pp. 48-53
Author(s):  
Chun-Han Ku ◽  
Wei-Kai Wang ◽  
Ray-Hua Horng
2014 ◽  
Author(s):  
Yu-Hsiang Yeh ◽  
Jinn-Kong Sheu ◽  
Ming-Lun Lee ◽  
Po-Cheng Chen ◽  
Yu-Chen Yang ◽  
...  

Micromachines ◽  
2019 ◽  
Vol 10 (12) ◽  
pp. 860 ◽  
Author(s):  
Shuyu Lan ◽  
Hui Wan ◽  
Jie Zhao ◽  
Shengjun Zhou

Micro-scale light emitting diodes (micro-LEDs) commonly employ a thin-film flip-chip (TFFC) structure whose substrate is lifted off by an excimer laser. However, flip-chip (FC) micro-LEDs with a substrate can provide a sharp rise on sidewall emission by increasing the sidewall area. Here, we investigate the influence of substrate thickness, encapsulation, surface texture, microstructures between the substrate and epilayer, as well as the size, cutting shape, and angle of the chip on the light extraction efficiencies (LEEs) of FC micro-LEDs by using the Monte Carlo ray tracing method. We find that the LEE of the blue FC micro-LED chip increases by 46.5% over that of the blue TFFC micro-LED chip. After the encapsulation with the epoxy lens is applied, the LEEs of the blue TFFC micro-LED and blue FC micro-LED increase by 129% and 110.5%, respectively. The underlying mechanisms for the use of surface texture, patterned sapphire substrate, air-void array, and chip shaping technologies to improve the LEEs of FC micro-LEDs are also investigated in detail. We find that the LEEs AlGaInP based red FC micro-LED and GaN based blue/green FC micro-LEDs exhibit a sharp rise when the chip size drops from 30 to 10 µm. The inverted trapezoid FC micro-LED with patterned sapphire substrate (PSS) and encapsulation shows extraordinarily strong top emission and high collimation. We believe that our study offers a promising and practical route for obtaining high efficiency micro-LEDs.


Photonics ◽  
2021 ◽  
Vol 8 (6) ◽  
pp. 196
Author(s):  
Tsung-Chi Hsu ◽  
Yu-Tsai Teng ◽  
Yen-Wei Yeh ◽  
Xiaotong Fan ◽  
Kuo-Hsiung Chu ◽  
...  

High-quality epitaxial layers are directly related to internal quantum efficiency. The methods used to design such epitaxial layers are reviewed in this article. The ultraviolet C (UVC) light-emitting diode (LED) epitaxial layer structure exhibits electron leakage; therefore, many research groups have proposed the design of blocking layers and carrier transportation to generate high electron–hole recombination rates. This also aids in increasing the internal quantum efficiency. The cap layer, p-GaN, exhibits high absorption in deep UV radiation; thus, a small thickness is usually chosen. Flip chip design is more popular for such devices in the UV band, and the main factors for consideration are light extraction and heat transportation. However, the choice of encapsulation materials is important, because unsuitable encapsulation materials will be degraded by ultraviolet light irradiation. A suitable package design can account for light extraction and heat transportation. Finally, an atomic layer deposition Al2O3 film has been proposed as a mesa passivation layer. It can provide a low reverse current leakage. Moreover, it can help increase the quantum efficiency, enhance the moisture resistance, and improve reliability. UVC LED applications can be used in sterilization, water purification, air purification, and medical and military fields.


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