Quantitative depth profiling of ultra-shallow phosphorus implants in silicon using time-of-flight secondary ion mass spectrometry and the nuclear reaction 31P(α,p0)34S

M.A. Bolorizadeh; S. Ruffell; I.V. Mitchell; R. Gwilliam

doi:10.1016/j.nimb.2004.04.180

Quantitative depth profiling of ultra-shallow phosphorus implants in silicon using time-of-flight secondary ion mass spectrometry and the nuclear reaction 31P(α,p0)34S

Nuclear Instruments and Methods in Physics Research Section B Beam Interactions with Materials and Atoms ◽

10.1016/j.nimb.2004.04.180 ◽

2004 ◽

Vol 225 (3) ◽

pp. 345-352 ◽

Cited By ~ 13

Author(s):

M.A. Bolorizadeh ◽

S. Ruffell ◽

I.V. Mitchell ◽

R. Gwilliam

Keyword(s):

Mass Spectrometry ◽

Nuclear Reaction ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Are cluster ion analysis beams good choices for hydrogen depth profiling using time-of-flight secondary ion mass spectrometry?

Surface and Interface Analysis ◽

10.1002/sia.3776 ◽

2011 ◽

Vol 44 (1) ◽

pp. 89-93 ◽

Cited By ~ 10

Author(s):

Zihua Zhu ◽

Vaithiyalingam Shutthanandan

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion ◽

Ion Analysis

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Time-of-flight secondary ion mass spectrometry depth profiling of multiple quantum well II–VI semiconductors using negative cluster ions

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.590543 ◽

1999 ◽

Vol 17 (1) ◽

pp. 224 ◽

Cited By ~ 2

Author(s):

Jin Zhao ◽

Myunghee Na ◽

Patrick J. McKeown ◽

Huicheng Chang ◽

Eunhwa Lee ◽

...

Keyword(s):

Mass Spectrometry ◽

Quantum Well ◽

Secondary Ion Mass Spectrometry ◽

Multiple Quantum Well ◽

Time Of Flight ◽

Depth Profiling ◽

Cluster Ions ◽

Multiple Quantum ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Evaluation of sputtering induced surface roughness development of Ni/Cu multilayers thin films by Time-of-Flight Secondary Ion Mass Spectrometry depth profiling with different energies O2+ ion bombardment

Thin Solid Films ◽

10.1016/j.tsf.2018.10.049 ◽

2019 ◽

Vol 669 ◽

pp. 188-197

Author(s):

X.L. Yan ◽

M.M. Duvenhage ◽

J.Y. Wang ◽

H.C. Swart ◽

J.J. Terblans

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Surface Roughness ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Bombardment ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Quantitative depth profiling of Si1–xGex structures by time-of-flight secondary ion mass spectrometry and secondary neutral mass spectrometry

Thin Solid Films ◽

10.1016/j.tsf.2016.03.049 ◽

2016 ◽

Vol 607 ◽

pp. 25-31 ◽

Cited By ~ 3

Author(s):

M.N. Drozdov ◽

Y.N. Drozdov ◽

A. Csik ◽

A.V. Novikov ◽

K. Vad ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Ultra-shallow depth profiling with time-of-flight secondary ion mass spectrometry

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

10.1116/1.587143 ◽

1994 ◽

Vol 12 (1) ◽

pp. 214 ◽

Cited By ~ 5

Author(s):

J. Bennett

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Shallow Depth ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Depth Profiling of Poly(l-lactic acid)/Triblock Copolymer Blends with Time-of-Flight Secondary Ion Mass Spectrometry

Analytical Chemistry ◽

10.1021/ac048274i ◽

2005 ◽

Vol 77 (11) ◽

pp. 3570-3578 ◽

Cited By ~ 40

Author(s):

Christine M. Mahoney ◽

Jinxiang Yu ◽

Joseph A. Gardella

Keyword(s):

Mass Spectrometry ◽

Lactic Acid ◽

Triblock Copolymer ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Copolymer Blends ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Depth profiling cross-linked poly(methyl methacrylate) films: a time-of-flight secondary ion mass spectrometry approach

Rapid Communications in Mass Spectrometry ◽

10.1002/rcm.7801 ◽

2017 ◽

Vol 31 (4) ◽

pp. 381-388 ◽

Cited By ~ 6

Author(s):

Soheila Naderi-Gohar ◽

Kevin M.H. Huang ◽

Yiliang Wu ◽

Woon Ming Lau ◽

Heng-Yong Nie

Keyword(s):

Mass Spectrometry ◽

Methyl Methacrylate ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Poly Methyl Methacrylate ◽

Ion Mass Spectrometry ◽

Secondary Ion

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Molecular Depth Profiling of Multilayer Polymer Films Using Time-of-Flight Secondary Ion Mass Spectrometry

Analytical Chemistry ◽

10.1021/ac048945c ◽

2005 ◽

Vol 77 (3) ◽

pp. 911-922 ◽

Cited By ~ 86

Author(s):

M. S. Wagner

Keyword(s):

Mass Spectrometry ◽

Polymer Films ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Molecular Depth Profiling ◽

Secondary Ion

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Depth profiling of fullerene-containing structures by time-of-flight secondary ion mass spectrometry

Technical Physics Letters ◽

10.1134/s1063785013120183 ◽

2013 ◽

Vol 39 (12) ◽

pp. 1097-1100 ◽

Cited By ~ 8

Author(s):

M. N. Drozdov ◽

Yu. N. Drozdov ◽

G. L. Pakhomov ◽

V. V. Travkin ◽

P. A. Yunin ◽

...

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Secondary Ion

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3-D Molecular Depth Profiling of Biological and Polymeric Materials Using Time-of-Flight Secondary Ion Mass Spectrometry

Microscopy and Microanalysis ◽

10.1017/s143192761300531x ◽

2013 ◽

Vol 19 (S2) ◽

pp. 664-665

Author(s):

P.A. Clark ◽

E. Tallarek ◽

D. Breitenstein ◽

B. Hagenhoff ◽

N. Havercroft

Keyword(s):

Mass Spectrometry ◽

Secondary Ion Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Polymeric Materials ◽

Ion Mass Spectrometry ◽

Molecular Depth Profiling ◽

Secondary Ion

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.

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