Molecular Depth Profiling of Multilayer Polymer Films Using Time-of-Flight Secondary Ion Mass Spectrometry

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

3-D Molecular Depth Profiling of Biological and Polymeric Materials Using Time-of-Flight Secondary Ion Mass Spectrometry

Microscopy and Microanalysis ◽

10.1017/s143192761300531x ◽

2013 ◽

Vol 19 (S2) ◽

pp. 664-665

Author(s):

P.A. Clark ◽

E. Tallarek ◽

D. Breitenstein ◽

B. Hagenhoff ◽

N. Havercroft

Keyword(s):

Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Polymeric Materials ◽

Ion Mass Spectrometry ◽

Extended abstract of a paper presented at Microscopy and Microanalysis 2013 in Indianapolis, Indiana, USA, August 4 – August 8, 2013.

Are cluster ion analysis beams good choices for hydrogen depth profiling using time-of-flight secondary ion mass spectrometry?

Surface and Interface Analysis ◽

10.1002/sia.3776 ◽

2011 ◽

Vol 44 (1) ◽

pp. 89-93 ◽

Cited By ~ 10

Author(s):

Zihua Zhu ◽

Vaithiyalingam Shutthanandan

Keyword(s):

Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Cluster Ion ◽

Secondary Ion ◽

Ion Analysis

Surface analysis of plasma-deposited polymer films by Time of Flight Static Secondary Ion Mass Spectrometry (ToF-SSIMS) before and after exposure to ambient air

Surface and Coatings Technology ◽

10.1016/j.surfcoat.2005.02.032 ◽

2005 ◽

Vol 200 (1-4) ◽

pp. 463-467 ◽

Cited By ~ 23

Author(s):

U. Oran ◽

S. Swaraj ◽

J.F. Friedrich ◽

W.E.S. Unger

Keyword(s):

Mass Spectrometry ◽

Surface Analysis ◽

Polymer Films ◽

Time Of Flight ◽

Ambient Air ◽

Ion Mass Spectrometry ◽

Before And After ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Time-of-flight secondary ion mass spectrometry depth profiling of multiple quantum well II–VI semiconductors using negative cluster ions

10.1116/1.590543 ◽

1999 ◽

Vol 17 (1) ◽

pp. 224 ◽

Cited By ~ 2

Author(s):

Jin Zhao ◽

Myunghee Na ◽

Patrick J. McKeown ◽

Huicheng Chang ◽

Eunhwa Lee ◽

...

Keyword(s):

Mass Spectrometry ◽

Quantum Well ◽

Multiple Quantum Well ◽

Time Of Flight ◽

Depth Profiling ◽

Cluster Ions ◽

Multiple Quantum ◽

Ion Mass Spectrometry ◽

Molecular Depth Profiling with Cluster Secondary Ion Mass Spectrometry and Wedges

Analytical Chemistry ◽

10.1021/ac902313q ◽

2010 ◽

Vol 82 (1) ◽

pp. 57-60 ◽

Cited By ~ 21

Author(s):

Dan Mao ◽

Andreas Wucher ◽

Nicholas Winograd

Keyword(s):

Mass Spectrometry ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Carbon-13 Labeled Polymers: An Alternative Tracer for Depth Profiling of Polymer Films and Multilayers Using Secondary Ion Mass Spectrometry

Analytical Chemistry ◽

10.1021/ac060133o ◽

2006 ◽

Vol 78 (10) ◽

pp. 3452-3460 ◽

Cited By ~ 5

Author(s):

S. E. Harton ◽

F. A. Stevie ◽

Z. Zhu ◽

H. Ade

Keyword(s):

Mass Spectrometry ◽

Polymer Films ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Molecular Depth Profiling of Buried Lipid Bilayers Using C60-Secondary Ion Mass Spectrometry

Analytical Chemistry ◽

10.1021/ac102525v ◽

2011 ◽

Vol 83 (1) ◽

pp. 351-358 ◽

Cited By ~ 26

Author(s):

Caiyan Lu ◽

Andreas Wucher ◽

Nicholas Winograd

Keyword(s):

Mass Spectrometry ◽

Lipid Bilayers ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Evaluation of sputtering induced surface roughness development of Ni/Cu multilayers thin films by Time-of-Flight Secondary Ion Mass Spectrometry depth profiling with different energies O2+ ion bombardment

Thin Solid Films ◽

10.1016/j.tsf.2018.10.049 ◽

2019 ◽

Vol 669 ◽

pp. 188-197

Author(s):

X.L. Yan ◽

M.M. Duvenhage ◽

J.Y. Wang ◽

H.C. Swart ◽

J.J. Terblans

Keyword(s):

Mass Spectrometry ◽

Thin Films ◽

Surface Roughness ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Bombardment ◽

Ion Mass Spectrometry ◽

Quantitative depth profiling of Si1–xGex structures by time-of-flight secondary ion mass spectrometry and secondary neutral mass spectrometry

Thin Solid Films ◽

10.1016/j.tsf.2016.03.049 ◽

2016 ◽

Vol 607 ◽

pp. 25-31 ◽

Cited By ~ 3

Author(s):

M.N. Drozdov ◽

Y.N. Drozdov ◽

A. Csik ◽

A.V. Novikov ◽

K. Vad ◽

...

Keyword(s):

Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Ion Mass Spectrometry ◽

Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ◽

Ultra-shallow depth profiling with time-of-flight secondary ion mass spectrometry

10.1116/1.587143 ◽

1994 ◽

Vol 12 (1) ◽

pp. 214 ◽

Cited By ~ 5

Author(s):

J. Bennett

Keyword(s):

Mass Spectrometry ◽

Time Of Flight ◽

Depth Profiling ◽

Shallow Depth ◽

Ion Mass Spectrometry ◽