Second harmonic generation in ZnO thin films fabricated by metalorganic chemical vapor deposition

2004 ◽  
Vol 237 (1-3) ◽  
pp. 65-70 ◽  
Author(s):  
C.Y. Liu ◽  
B.P. Zhang ◽  
N.T. Binh ◽  
Y. Segawa
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Second Harmonic Generation ◽  
Harmonic Generation ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Second Harmonic ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Metalorganic Chemical

Growth of Epitaxial BaTiO3 Thin Films at 600°C by Metalorganic Chemical Vapor Deposition

1994 ◽  
Vol 361 ◽  
Author(s):  
D.L. Kaiser ◽  
M.D. Vaudin ◽  
L.D. Rotter ◽  
Z.L. Wang ◽  
J.P. Cline ◽  
...  
Keyword(s):  
Thin Films ◽  
Chemical Vapor Deposition ◽  
Electron Diffraction ◽  
Harmonic Generation ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Second Harmonic ◽  
Chemical Vapor ◽  
X Ray ◽  
Metalorganic Chemical

ABSTRACTMetalorganic chemical vapor deposition (MOCVD) was used to deposit epitaxial BaTiO3 thin films on (100) MgO substrates at 600°C. The metalorganic precursors employed in the deposition experiments were hydrated Ba(thd)2 (thd = C11H19O2) and titanium isopropoxide. The films were analyzed by means of transmittance spectroscopy, wavelength dispersive x-ray spectrometry, secondary ion mass spectrometry depth profiling, x-ray diffraction, high resolution transmission electron microscopy, selected area electron diffraction, nanoscale energy dispersive x-ray spectrometry and second harmonic generation measurements. There was no evidence for interdiffusion between the film and substrate. The x-ray and electron diffraction studies showed that the films were oriented with the a-axis normal to the substrate surface, whereas second harmonic generation measurements showed that the films had some c-axis character.

Textured ZnO Thin Films for Solar Cells Grown by Metalorganic Chemical Vapor Deposition

1991 ◽  
Vol 30 (Part 2, No. 3B) ◽  
pp. L441-L443 ◽  
Author(s):  
Wilson W. Wenas ◽  
Akira Yamada ◽  
Makoto Konagai ◽  
Kiyoshi Takahashi
Keyword(s):  
Thin Films ◽  
Solar Cells ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Metalorganic Chemical

Plasma-assisted metalorganic chemical vapor deposition growth of ZnO thin films

2006 ◽  
Vol 21 (7) ◽  
pp. 1632-1637 ◽  
Author(s):  
Maria Losurdo ◽  
Maria M. Giangregorio ◽  
A. Sacchetti ◽  
Pio Capezzuto ◽  
Giovanni Bruno ◽  
...  
Keyword(s):  
Thin Films ◽  
Optical Properties ◽  
Chemical Vapor Deposition ◽  
Vapor Deposition ◽  
Metalorganic Chemical Vapor Deposition ◽  
Chemical Vapor ◽  
Zno Thin Films ◽  
Zno Films ◽  
Chemical Vapor Deposition Growth ◽  
Metalorganic Chemical

ZnO thin films have been grown by metalorganic chemical vapor deposition (MOCVD) and plasma-assisted (PA) MOCVD on c-axis-oriented sapphire (0001) and Si (001) substrates using the novel Zn(2-thenoyltrifluoroacetonate)2·N,N,N′,N′-tetramethylethylendiamine precursor. The structural, morphological, and optical properties of ZnO films have been investigated. The results show that the O2 PA growth results in highly c-axis-oriented hexagonal ZnO thin films also on cubic substrates. PA-MOCVD ZnO films have good optical properties, as inferred by the presence of a sharp and intense exciton in the dielectric function.

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