Numerical simulation of inductive method for measuring critical current density of HTS thin film

2008 ◽  
Vol 468 (15-20) ◽  
pp. 1685-1687 ◽  
Author(s):  
T. Takayama ◽  
S. Ikuno ◽  
A. Kamitani
Keyword(s):  
Thin Film ◽  
Numerical Simulation ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Inductive Method

Microstructural characterization of YBa2Cu3O7-x thin films formed by metalorganic CVD

1991 ◽  
Vol 49 ◽  
pp. 1080-1081
Author(s):  
P. Lu ◽  
W. Huang ◽  
C.S. Chern ◽  
Y.Q. Li ◽  
J. Zhao ◽  
...  
Keyword(s):  
Thin Film ◽  
Thin Films ◽  
Critical Current Density ◽  
Critical Current ◽  
Current Density ◽  
Film Growth ◽  
Chemical Vapor ◽  
Microstructural Characterization ◽  
Ion Milling ◽  
Conventional Grinding

The YBa2Cu3O7-x thin films formed by metalorganic chemical vapor deposition(MOCVD) have been reported to have excellent superconducting properties including a sharp zero resistance transition temperature (Tc) of 89 K and a high critical current density of 2.3x106 A/cm2 or higher. The origin of the high critical current in the thin film compared to bulk materials is attributed to its structural properties such as orientation, grain boundaries and defects on the scale of the coherent length. In this report, we present microstructural aspects of the thin films deposited on the (100) LaAlO3 substrate, which process the highest critical current density.Details of the thin film growth process have been reported elsewhere. The thin films were examined in both planar and cross-section view by electron microscopy. TEM sample preparation was carried out using conventional grinding, dimpling and ion milling techniques. Special care was taken to avoid exposure of the thin films to water during the preparation processes.

Estimation of Local Current Transport Properties in Thin Film Superconductor Based on Scanning Hall-probe Microscopy

2012 ◽  
Vol 1434 ◽  
Author(s):  
Kohei Higashikawa ◽  
Kei Shiohara ◽  
Masayoshi Inoue ◽  
Takanobu Kiss ◽  
Masateru Yoshizumi ◽  
...  
Keyword(s):  
Magnetic Field ◽  
Thin Film ◽  
Critical Current Density ◽  
Electric Field ◽  
Critical Current ◽  
Current Density ◽  
Limiting Factors ◽  
Hall Probe ◽  
Scanning Hall Probe Microscopy ◽  
Field Criterion

ABSTRACTTo enhance a global critical current in a superconductor, it is indispensable to understand current limiting factors and their influence on such a critical current. From this point of view, we have investigated in-plane distribution of local critical current density and its electric field criterion in a thin-film superconductor by using scanning-Hall probe microscopy. In a remanent state, after the application of sufficiently high magnetic field to a sample, current flows at critical current density according to the critical state model. Such distribution of current density was estimated from that of measured magnetic field using the Biot-Savart law. Furthermore, the corresponding electric field criterion was evaluated from the relaxation of such remanent magnetic field by considering Faraday’s law. This means that we could estimate in-plane distribution of local critical current density as a function of electric field criterion in a nondestructive manner. This characterization method would be very helpful for finding current limiting factors in a thin-film superconductor and their influence on its global current density versus electric field properties which would usually be obtained by four-probe method.

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