Characterization of the impurity profile at the SiO2/Si interface using a combination of total reflection X-ray fluorescence spectrometry and successive etching of silicon
2007 ◽
Vol 62
(5)
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pp. 481-484
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2018 ◽
Vol 143
◽
pp. 18-25
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2001 ◽
Vol 56
(11)
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pp. 2235-2246
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2021 ◽
Vol 175
◽
pp. 106012
Characterization of Near Surface Layers by Means of Total Reflection X-Ray Fluorescence Spectrometry
1991 ◽
Vol 35
(B)
◽
pp. 941-946
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Keyword(s):
X Ray
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2005 ◽
Vol 103
(3)
◽
pp. 277-290
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2014 ◽
Vol 300
(1)
◽
pp. 137-145
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