Development of Total Reflection X-ray fluorescence spectrometry quantitative methodologies for elemental characterization of building materials and their degradation products

2018 ◽  
Vol 143 ◽  
pp. 18-25 ◽  
Author(s):  
Cristina García-Florentino ◽  
Maite Maguregui ◽  
Eva Marguí ◽  
Laura Torrent ◽  
Ignasi Queralt ◽  
...  
2010 ◽  
Vol 65 (2) ◽  
pp. 167-170 ◽  
Author(s):  
Sangita Dhara ◽  
N.L. Misra ◽  
S.D. Maind ◽  
Sanjukta A. Kumar ◽  
N. Chattopadhyay ◽  
...  

1991 ◽  
Vol 35 (B) ◽  
pp. 941-946 ◽  
Author(s):  
H. Schwenke ◽  
R. Gutschke ◽  
J. Knoth

AbstractTotal Reflection X-ray Fluorescence Spectrometry (TXRF) has been used for the characterisation of a 20 nm thick Ni/Fe/Cr-layer on a silicon substrate. Instrumental aspects of the technique as well as the data evaluation procedure on the basis of modelling calculations are outlined in this paper. The effect of standing waves is discussed by means of the selected example. This particular layer serves also as an illustration of the capabilities and limitations of TXRF. At least three surface parameters are covered by the technique, elemental composition, density and layer thickness.


2005 ◽  
Vol 103 (3) ◽  
pp. 277-290 ◽  
Author(s):  
Orghêda L. A. D. Zucchi ◽  
Silvana Moreira ◽  
Edgar F. O. de Jesus ◽  
Helio Salvio Neto ◽  
Marcos J. Salvador

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