Electron field emission from silicon tip arrays coated by magnetron sputtering carbon nitride film

2004 ◽  
Vol 132 (3-4) ◽  
pp. 253-257 ◽  
Author(s):  
J.J. Li ◽  
W.T. Zheng ◽  
C.Z. Gu ◽  
Z.S. Jin
2002 ◽  
Vol 407 (1-2) ◽  
pp. 104-108 ◽  
Author(s):  
Hiroyuki Sugimura ◽  
Yoshiki Sato ◽  
Yoshiaki Ando ◽  
Nobuhiro Tajima ◽  
Osamu Takai

2014 ◽  
Vol 2014 ◽  
pp. 1-8 ◽  
Author(s):  
Qiong Wang ◽  
Jinlong Jiang

Carbon nitride films have excellent properties and wide application prospects in the aspect of field emission properties. In this review structure characteristics and a variety of synthetic methods of carbon nitride film will be described. In the carbon nitrogen films, we mainly from the following three points: sp2/sp3ratio, surface morphology and N content to discuss the change of field emission properties. Appropriate sp2/sp3(about 1.0–1.25) ratio, N content (about 8 at.%–10 at.%), and rough surfaces will strengthen the field emission properties.


2005 ◽  
Vol 14 (3-7) ◽  
pp. 719-723 ◽  
Author(s):  
Chiharu Kimura ◽  
Kunitaka Okada ◽  
Shingo Funakawa ◽  
Shinichiro Sakata ◽  
Takashi Sugino

2000 ◽  
Vol 9 (3-6) ◽  
pp. 1228-1232 ◽  
Author(s):  
Y.K. Yap ◽  
S. Kida ◽  
Y. Wada ◽  
M. Yoshimura ◽  
Y. Mori ◽  
...  

2000 ◽  
Vol 44 (5) ◽  
pp. 304-308 ◽  
Author(s):  
X.W Liu ◽  
C.H Lin ◽  
L.T Chao ◽  
H.C Shih

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