Electron affinity and field emission characteristics of boron carbon nitride film

2005 ◽  
Vol 14 (3-7) ◽  
pp. 719-723 ◽  
Author(s):  
Chiharu Kimura ◽  
Kunitaka Okada ◽  
Shingo Funakawa ◽  
Shinichiro Sakata ◽  
Takashi Sugino
Keyword(s):  
Field Emission ◽  
Electron Affinity ◽  
Carbon Nitride ◽  
Nitride Film ◽  
Emission Characteristics ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Boron carbon nitride film containing hydrogen for 2nm node low-k interconnection

2009 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Takuroh Masuzumi ◽  
Makoto Hara ◽  
Daisuke Watanabe ◽  
Chiharu Kimura ◽  
...  
Keyword(s):  
Carbon Nitride ◽  
Nitride Film ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Low K ◽  
Boron Carbon

Characterization of boron carbon nitride film for humidity sensor

2007 ◽  
Vol 16 (4-7) ◽  
pp. 1300-1303 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Hidekazu Shima ◽  
Chiharu Kimura ◽  
Takashi Sugino
Keyword(s):  
Carbon Nitride ◽  
Humidity Sensor ◽  
Nitride Film ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Field-emission characteristics of boron–carbon–nitride nanofilm

2005 ◽  
Vol 23 (5) ◽  
pp. 1948 ◽  
Author(s):  
Chiharu Kimura ◽  
Hidekazu Shima ◽  
Kunitaka Okada ◽  
Shingo Funakawa ◽  
Takashi Sugino
Keyword(s):  
Field Emission ◽  
Carbon Nitride ◽  
Emission Characteristics ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Characterization of boron carbon nitride film modified by excimer laser annealing

2007 ◽  
Vol 254 (2) ◽  
pp. 596-599 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Kazutoshi Ohyama ◽  
Hiroshi Sota ◽  
Toshiaki Seino ◽  
Chiharu Kimura ◽  
...  
Keyword(s):  
Excimer Laser ◽  
Carbon Nitride ◽  
Laser Annealing ◽  
Nitride Film ◽  
Excimer Laser Annealing ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Influence of oxygen plasma treatment on boron carbon nitride film composition

2009 ◽  
Vol 255 (6) ◽  
pp. 3635-3638 ◽  
Author(s):  
Hidemitsu Aoki ◽  
Takuro Masuzumi ◽  
Daisuke Watanabe ◽  
M.K. Mazumder ◽  
Hiroshi Sota ◽  
...  
Keyword(s):  
Plasma Treatment ◽  
Carbon Nitride ◽  
Oxygen Plasma ◽  
Nitride Film ◽  
Oxygen Plasma Treatment ◽  
Film Composition ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

Suppression of Fluorine Diffusion into Methyl Boron Carbon Nitride Film Using Low-Temperature Etching

2010 ◽  
Vol 49 (4) ◽  
pp. 04DB10
Author(s):  
Makoto Hara ◽  
Takuro Masuzumi ◽  
Zhiming Lu ◽  
Chiharu Kimura ◽  
Hidemitsu Aoki ◽  
...  
Keyword(s):  
Low Temperature ◽  
Carbon Nitride ◽  
Nitride Film ◽  
Carbon Nitride Film ◽  
Boron Carbon Nitride ◽  
Boron Carbon

scholarly journals An Overview on Structure and Field Emission Properties of Carbon Nitride Films

2014 ◽  
Vol 2014 ◽  
pp. 1-8 ◽  
Author(s):  
Qiong Wang ◽  
Jinlong Jiang
Keyword(s):  
Field Emission ◽  
Carbon Nitride ◽  
Synthetic Methods ◽  
Nitride Film ◽  
N Content ◽  
Emission Properties ◽  
Structure Characteristics ◽  
Field Emission Properties ◽  
Carbon Nitride Film ◽  
Application Prospects

Carbon nitride films have excellent properties and wide application prospects in the aspect of field emission properties. In this review structure characteristics and a variety of synthetic methods of carbon nitride film will be described. In the carbon nitrogen films, we mainly from the following three points: sp2/sp3ratio, surface morphology and N content to discuss the change of field emission properties. Appropriate sp2/sp3(about 1.0–1.25) ratio, N content (about 8 at.%–10 at.%), and rough surfaces will strengthen the field emission properties.

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