Influence of aluminum ion implantation on oxidation behavior in air at 500 °C of TiN coatings

2005 ◽  
Vol 191 (2-3) ◽  
pp. 212-215 ◽  
Author(s):  
Q.G. Zhou ◽  
X.D. Bai ◽  
X.Y. Xue ◽  
X.W. Chen ◽  
J. Xu ◽  
...  
Keyword(s):  
Ion Implantation ◽  
Oxidation Behavior ◽  
Aluminum Ion ◽  
Tin Coatings

Effective Work-Function Modulation by Aluminum-Ion Implantation for Metal-Gate Technology $(\hbox{Poly-Si/TiN/SiO}_{2})$

2007 ◽  
Vol 28 (12) ◽  
pp. 1089-1091 ◽  
Author(s):  
R. Singanamalla ◽  
H. Y. Yu ◽  
B. Van Daele ◽  
S. Kubicek ◽  
K. De Meyer
Keyword(s):  
Ion Implantation ◽  
Work Function ◽  
Metal Gate ◽  
Effective Work ◽  
Effective Work Function ◽  
Aluminum Ion

scholarly journals TiN Coatings on Titanium Substrates Using Plasma Assisted Ion Implantation

2015 ◽  
Vol 591 ◽  
pp. 012043 ◽  
Author(s):  
M Cisternas ◽  
F Mellero ◽  
M Favre ◽  
H Bhuyan ◽  
E Wyndham
Keyword(s):  
Ion Implantation ◽  
Tin Coatings ◽  
Titanium Substrates

Ion Implantation Damage in Aluminum Studied by Quantitative Electron Chanelling and Tem.

1988 ◽  
Vol 100 ◽  
Author(s):  
Ronald G. Vardiman
Keyword(s):  
Dislocation Density ◽  
Ion Implantation ◽  
Linear Relationship ◽  
Aluminum Ion ◽  
Weak Beam ◽  
Implantation Damage ◽  
Boron Implantation

ABSTRACTElectron chanelling linewidth changes in aluminum have been measured as a function of dose for boron and aluminum ion implantation. Weak beam TEM observations assist interpretation of the results by showing the nature and degree of the damage. For self implantation, a linear relationship between dose, linewidth, and dislocation density has been found up to 3×1017ions/cm2. For boron implantation, a new point-like defect appears at the higher boron concentrations, giving a much slower increase of chanelling linewidth with dose above l×1016 ions/cm2. Boron interaction with the damage stabilizes higher damage acumilations than for sel f-i mpl antati on.

scholarly journals Mechanism of improvement of TiN-coated tool life by nitrogen implantation

2001 ◽  
Vol 16 (11) ◽  
pp. 3293-3303 ◽  
Author(s):  
S. J. Bull ◽  
Yu. P. Sharkeev ◽  
S. V. Fortuna ◽  
I. A. Shulepov ◽  
A. J. Perry
Keyword(s):  
Ion Implantation ◽  
Surface Composition ◽  
Slight Reduction ◽  
Nitrogen Implantation ◽  
Force Microscopy ◽  
Tin Coatings ◽  
Coated Tools ◽  
Atomic Force ◽  
Transmission Electron ◽  
Coated Tool

The life of TiN-coated tools can be improved by a post-coating ion implantation treatment, but the mechanism by which this occurs is still not clear. Nitrogen implantation of both physical-vapor-deposited TiN and CVD TiN leads to surface softening as the dose increases, which has been attributed to amorphization. In this study a combination of transmission electron microscopy and atomic force microscopy was used to characterize the microstructure of implanted TiN coatings on cemented carbide for comparison with mechanical property measurements (nanoindentation, residual stress, etc.), made on the same samples. Ion implantation leads to a slight reduction in the grain size of the TiN in the implanted zone, but there is no evidence for amorphization. Surface softening is observed for physical-vapor-deposited TiN, but this is probably due to a combination of changes in surface composition and the presence of a layer of bubbles generated by the very high implantation doses used.

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