Microstructure and characterization of aluminum oxide thin films prepared by reactive RF magnetron sputtering on copper

2005 ◽  
Vol 198 (1-3) ◽  
pp. 152-155 ◽  
Author(s):  
Chien-Ming Chiang ◽  
Li-Shin Chang
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Aluminum Oxide ◽  
Rf Magnetron Sputtering ◽  
Oxide Thin Films ◽  
Reactive Rf Magnetron Sputtering

scholarly journals HRTEM Microstructural Characterization of β-WO3 Thin Films Deposited by Reactive RF Magnetron Sputtering

Materials ◽  
2017 ◽  
Vol 10 (2) ◽  
pp. 200 ◽  
Author(s):  
A. Faudoa-Arzate ◽  
A. Arteaga-Durán ◽  
R.J. Saenz-Hernández ◽  
M.E. Botello-Zubiate ◽  
P.R. Realyvazquez-Guevara ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Microstructural Characterization ◽  
Rf Magnetron Sputtering ◽  
Wo3 Thin Films ◽  
Reactive Rf Magnetron Sputtering

scholarly journals Cu 4O3 thin films deposited by non-reactive rf-magnetron sputtering from a copper oxide target

2021 ◽  
Vol 67 (3 May-Jun) ◽  
pp. 495
Author(s):  
M. A. Cruz Almazán ◽  
E. Vigueras Santiago ◽  
R. López ◽  
S. Hernández López ◽  
V. Hugo Castrejón Sánchez ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Copper Oxide ◽  
Cuprous Oxide ◽  
Cupric Oxide ◽  
Rf Magnetron Sputtering ◽  
X Ray Diffraction ◽  
Oxide Thin Films ◽  
X Ray ◽  
Reactive Rf Magnetron Sputtering

Copper oxide thin films deposited by sputtering are frequently formed by using metal copper targets in reactive atmospheres. In this report, paramelaconite (Cu4O3) thin films were deposited by non-reactive rf magnetron sputtering. The target used for sputtering was a copper oxide disk fabricated by oxidation of metal copper at 1000 °C for 24 h in airatmosphere. X-ray diffraction (XRD) results showed that the copper oxide target was mainly composed of cupric oxide (CuO) and cuprous oxide (Cu2O) crystals. Raman analyses suggested that the surface of the copper oxide disk is composed by a (CuO) layer. XRD measurements performed to the copper oxide thin films deposited by non-reactive rf magnetron sputtering showed that the film is composed of (Cu4O3) crystals. However,Raman measurements indicated that the Cu4O3 thin films are also composed by amorphous CuO and Cu2O.

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