Surface modification of Ti implants by plasma oxidation in hollow cathode discharge

2006 ◽  
Vol 200 (8) ◽  
pp. 2618-2626 ◽  
Author(s):  
M.A.M. Silva ◽  
A.E. Martinelli ◽  
C. Alves ◽  
R.M. Nascimento ◽  
M.P. Távora ◽  
...  
Keyword(s):  
Surface Modification ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Plasma Oxidation

Comparison of plasma characteristics of high-power pulsed sputtering glow discharge and hollow-cathode discharge

2020 ◽  
Vol 60 (1) ◽  
pp. 015501
Author(s):  
Shoki Abe ◽  
Katsuyuki Takahashi ◽  
Seiji Mukaigawa ◽  
Koichi Takaki ◽  
Ken Yukimura
Keyword(s):  
Glow Discharge ◽  
High Power ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Plasma Characteristics

Effect of aging the hollow cathode by sputtering on the analytical precision of the hollow cathode discharge emission source

1992 ◽  
Vol 64 (17) ◽  
pp. 1831-1835 ◽  
Author(s):  
Jih Lie. Tseng ◽  
Jau Yurn. Kung ◽  
J. C. Williams ◽  
Steven T. Griffin
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Emission Source ◽  
Analytical Precision

Comparison of trace analytical results obtained with different hollow cathode discharge lamps

1985 ◽  
Vol 85 (1-2) ◽  
pp. 15-22
Author(s):  
Zs. Vámos-Szilvássy ◽  
A. Buzási-Győrfi
Keyword(s):  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Analytical Results

Subcritical Hopf bifurcation in NeNd hollow cathode discharge

1994 ◽  
Vol 196 (3-4) ◽  
pp. 191-194 ◽  
Author(s):  
P.R. Sasi Kumar ◽  
V.P.N. Nampoori ◽  
C.P.G. Vallabhan
Keyword(s):  
Hopf Bifurcation ◽  
Hollow Cathode ◽  
Hollow Cathode Discharge ◽  
Subcritical Hopf Bifurcation
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