Effect of Al content on the microstructure and mechanical properties of Mo–Al–Si–N films synthesized by DC magnetron sputtering

2010 ◽  
Vol 204 (21-22) ◽  
pp. 3371-3375 ◽  
Author(s):  
Z.G. Yuan ◽  
J.F. Yang ◽  
X.P. Wang ◽  
Q.F. Fang
2013 ◽  
Vol 303-306 ◽  
pp. 2514-2518 ◽  
Author(s):  
Li Jie Hu ◽  
Lin Zhang ◽  
Jie Lin ◽  
Guang Hui Min

Lathanum hexaboride films were deposited by dc magnetron sputtering with the same sputtering parameters. AFM, XRD, Raman spectrum was used to characterize the film. The as-deposited films were annealed at 400 oC, 500 oC and 600 oC, respectively. After 400 oC’s annealing, morphology of fracture cross-sections of the films exhibited evolutions from columnar to the equiaxial, and the crystallinity of the film was improved as well. It was also found annealing process generated negative effect on the film’s hardness and elastic modulus.


2011 ◽  
Vol 205 (19) ◽  
pp. 4471-4479 ◽  
Author(s):  
Andrzej Czyżniewski ◽  
Witold Gulbiński ◽  
György Radnóczi ◽  
Marianna Szerencsi ◽  
Mieczysław Pancielejko

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