Microstructure and mechanical properties of hard Ti–Si–C–N films deposited by dc magnetron sputtering of multicomponent Ti/C/Si target

2011 ◽  
Vol 205 (21-22) ◽  
pp. 5068-5072 ◽  
Author(s):  
A.A. Onoprienko ◽  
V.I. Ivashchenko ◽  
S.N. Dub ◽  
O.Yu. Khyzhun ◽  
I.I. Timofeeva
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Dc Magnetron Sputtering ◽  
Microstructure And Mechanical Properties

Anealing Effect on the Microstructure and Mechanical Properties of LaB6 Films

2013 ◽  
Vol 303-306 ◽  
pp. 2514-2518 ◽  
Author(s):  
Li Jie Hu ◽  
Lin Zhang ◽  
Jie Lin ◽  
Guang Hui Min
Keyword(s):  
Mechanical Properties ◽  
Raman Spectrum ◽  
Elastic Modulus ◽  
Magnetron Sputtering ◽  
Cross Sections ◽  
Annealing Process ◽  
Dc Magnetron Sputtering ◽  
Microstructure And Mechanical Properties ◽  
Negative Effect ◽  
Deposited Films

Lathanum hexaboride films were deposited by dc magnetron sputtering with the same sputtering parameters. AFM, XRD, Raman spectrum was used to characterize the film. The as-deposited films were annealed at 400 oC, 500 oC and 600 oC, respectively. After 400 oC’s annealing, morphology of fracture cross-sections of the films exhibited evolutions from columnar to the equiaxial, and the crystallinity of the film was improved as well. It was also found annealing process generated negative effect on the film’s hardness and elastic modulus.

Microstructure and mechanical properties of W-C:H coatings deposited by pulsed reactive magnetron sputtering

2011 ◽  
Vol 205 (19) ◽  
pp. 4471-4479 ◽  
Author(s):  
Andrzej Czyżniewski ◽  
Witold Gulbiński ◽  
György Radnóczi ◽  
Marianna Szerencsi ◽  
Mieczysław Pancielejko
Keyword(s):  
Mechanical Properties ◽  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
Reactive Magnetron ◽  
Microstructure And Mechanical Properties
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