Features of copper coatings growth at high-rate deposition using magnetron sputtering systems with a liquid metal target

2017 ◽  
Vol 324 ◽  
pp. 111-120 ◽  
Author(s):  
G.A. Bleykher ◽  
A.O. Borduleva ◽  
A.V. Yuryeva ◽  
V.P. Krivobokov ◽  
J. Lančok ◽  
...  
Keyword(s):  
Liquid Metal ◽  
Magnetron Sputtering ◽  
High Rate ◽  
Metal Target ◽  
Copper Coatings

Hydrodynamic characteristics of an experimental model of the target in the MK-1 liquid-metal target system

Atomic Energy ◽  
2006 ◽  
Vol 101 (3) ◽  
pp. 636-643
Author(s):  
A. A. Boronin ◽  
A. D. Efanov ◽  
Yu. D. Levchenko ◽  
Yu. I. Orlov ◽  
V. S. Fedotovskii
Keyword(s):  
Liquid Metal ◽  
Experimental Model ◽  
Target System ◽  
Hydrodynamic Characteristics ◽  
Metal Target

Magnetron sputtering system stabilisation for high rate deposition of AlN films

Vacuum ◽  
1998 ◽  
Vol 49 (3) ◽  
pp. 247-251
Author(s):  
Alexey A Fomin ◽  
Vladislav Akhmatov ◽  
Sergey V Selishchev
Keyword(s):  
Magnetron Sputtering ◽  
High Rate ◽  
Sputtering System

High-rate deposition of optical coatings by closed-field magnetron sputtering

2005 ◽  
Author(s):  
D. R. Gibson ◽  
I. Brinkley ◽  
E. M. Waddell ◽  
J. M. Walls
Keyword(s):  
Magnetron Sputtering ◽  
High Rate ◽  
Optical Coatings ◽  
Closed Field

Ageing effects on electrical resistivity of Nb-doped TiO2 thin films deposited at a high rate by reactive DC magnetron sputtering

2018 ◽  
Vol 455 ◽  
pp. 267-275 ◽  
Author(s):  
Davide Casotti ◽  
Valentina Orsini ◽  
Alessandro di Bona ◽  
Sandra Gardonio ◽  
Mattia Fanetti ◽  
...  
Keyword(s):  
Thin Films ◽  
Electrical Resistivity ◽  
Magnetron Sputtering ◽  
High Rate ◽  
Dc Magnetron Sputtering ◽  
Tio2 Thin Films ◽  
Doped Tio2 ◽  
Ageing Effects

The properties of Cu films deposited by high rate magnetron sputtering from a liquid target

Vacuum ◽  
2019 ◽  
Vol 169 ◽  
pp. 108914 ◽  
Author(s):  
G.A. Bleykher ◽  
A.V. Yuryeva ◽  
A.S. Shabunin ◽  
D.V. Sidelev ◽  
V.A. Grudinin ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Rate ◽  
Cu Films

Basic concepts for the liquid-metal target loop of accelerator-controlled reactors

Atomic Energy ◽  
1996 ◽  
Vol 81 (3) ◽  
pp. 647-650
Author(s):  
A. V. Bezonosov ◽  
K. B. Veshnyakov ◽  
V. E. Serov
Keyword(s):  
Liquid Metal ◽  
Metal Target ◽  
Basic Concepts

scholarly journals High-Rate Deposition of Stoichiometric Compounds by Reactive Magnetron Sputtering at Oblique Angles

2016 ◽  
Vol 13 (10) ◽  
pp. 960-964 ◽  
Author(s):  
Rafael Alvarez ◽  
Aurelio Garcia-Valenzuela ◽  
Carmen Lopez-Santos ◽  
Francisco J. Ferrer ◽  
Victor Rico ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Reactive Magnetron Sputtering ◽  
High Rate ◽  
Reactive Magnetron
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