High rate reactive sputtering in an opposed cathode closed-field unbalanced magnetron sputtering system

1990 ◽  
Vol 43-44 ◽  
pp. 270-278 ◽  
Author(s):  
William D. Sproul ◽  
Paul J. Rudnik ◽  
Michael E. Graham ◽  
Suzanne L. Rohde
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