Dense VSiCN coatings deposited by filament-assisted reactive magnetron sputtering with varying amorphous phase precursor flow rates
Keyword(s):
2012 ◽
Vol 35
(4)
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pp. 505-511
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2017 ◽
Vol 4
(5)
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pp. 6173-6177
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2010 ◽
Vol 154-155
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pp. 1639-1642
High Temperature Material Processes (An International Quarterly of High-Technology Plasma Processes)
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2015 ◽
Vol 19
(2)
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pp. 105-112
Keyword(s):
Structure and Electrical Property of CuInS2 Thin Films Deposited by DC Reactive Magnetron Sputtering
2011 ◽
Vol 26
(12)
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pp. 1287-1292
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2019 ◽
Vol 37
(2)
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pp. 021203
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2011 ◽
Vol 21
(4)
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pp. 770-776
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