scholarly journals Noble gas control of diamond-like content and compressive stress in carbon films by arc-mixed mode high power impulse magnetron sputtering

2021 ◽  
pp. 127785
Author(s):  
Behnam Akhavan ◽  
Rajesh Ganesan ◽  
David T.A. Matthews ◽  
David.R. McKenzie ◽  
Marcela M.M. Bilek
Keyword(s):  
Magnetron Sputtering ◽  
Compressive Stress ◽  
High Power ◽  
Mixed Mode ◽  
Noble Gas ◽  
Carbon Films ◽  
Gas Control

Carbon films deposited by mixed-mode high power impulse magnetron sputtering for high wear resistance: The role of argon incorporation

2019 ◽  
Vol 688 ◽  
pp. 137353 ◽  
Author(s):  
Behnam Akhavan ◽  
Rajesh Ganesan ◽  
Michael Stueber ◽  
Sven Ulrich ◽  
David R. McKenzie ◽  
...  
Keyword(s):  
Wear Resistance ◽  
Magnetron Sputtering ◽  
High Power ◽  
Mixed Mode ◽  
Carbon Films ◽  
High Wear Resistance

scholarly journals Reactive High-Power Impulse Magnetron Sputtering of Chromium-Carbon Films

Coatings ◽  
2020 ◽  
Vol 10 (12) ◽  
pp. 1269
Author(s):  
Chin-Chiuan Kuo ◽  
Chun-Hui Lin ◽  
Jing-Tang Chang ◽  
Yu-Tse Lin
Keyword(s):  
Magnetron Sputtering ◽  
Amorphous Carbon ◽  
High Power ◽  
Deposition Temperature ◽  
Average Power ◽  
Carbon Films ◽  
Strengthening Effect ◽  
Substrate Bias ◽  
Hydrogenated Amorphous Carbon ◽  
Hydrogenated Amorphous

Chromium-carbon films were deposited by utilizing reactive high-power impulse magnetron sputtering at different mixture ratios of ethyne and argon atmosphere, and different substrate bias voltages and deposition temperature, with the same pulse frequency, duty cycle, and average power. The microstructure and mechanical properties of the obtained films were compared. The films consist of amorphous or nanocrystalline chromium carbide, hydrogenated amorphous carbon, and minor α-chromium phase. Decreasing the fraction of ethyne increases the content of the α-chromium phase but decreases hydrogenated amorphous carbon phase. The film’s hardness increases by enhancing the negative substrate bias and raising the deposition temperature, which could be attributed to the increase of film density and the Hall–Petch strengthening effect induced by the nanoscale crystallization of the amorphous carbide phase.

scholarly journals Ti-containing hydrogenated carbon films fabricated by high-power plasma magnetron sputtering

2012 ◽  
Vol 22 (6) ◽  
pp. 1381-1386 ◽  
Author(s):  
Peng YANG ◽  
Chia-chi SUNG ◽  
Yiin-kuen FUH ◽  
Chun-lin CHU ◽  
Chih-hung LO
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Carbon Films

Graphite-like carbon films by high power impulse magnetron sputtering

2013 ◽  
Vol 283 ◽  
pp. 321-326 ◽  
Author(s):  
Meidong Huang ◽  
Xueqian Zhang ◽  
Peiling Ke ◽  
Aiying Wang
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Carbon Films

Diamond-like carbon films prepared by high power impulse magnetron sputtering

2019 ◽  
Vol 17 ◽  
pp. 1549-1554
Author(s):  
Jidapa Lomon ◽  
Ponthip Chaiyabin ◽  
Prayoon Songsiriritthigul ◽  
Thanit Saisopa ◽  
Kittikhun Seawsakul ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
High Power ◽  
Carbon Films ◽  
Diamond Like Carbon
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