Complete prevention of reaction at HfO2/Si interfaces by 1nm silicon nitride layer
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2004 ◽
Vol 25
(8)
◽
pp. 532-534
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2004 ◽
Vol 43
(8A)
◽
pp. 5186-5198
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1988 ◽
Vol 43
(3)
◽
pp. 293-301
◽
Keyword(s):
2013 ◽
Vol 383
◽
pp. 36-42
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Keyword(s):
Keyword(s):