Fabrication of PTFE thin films by dual catalytic chemical vapor deposition method

Hiroaki Yasuoka; Masahiro Yoshida; Ken Sugita; Keisuke Ohdaira; Hideyuki Murata; Hideki Matsumura

doi:10.1016/j.tsf.2007.06.185

Fabrication of PTFE thin films by dual catalytic chemical vapor deposition method

Thin Solid Films ◽

10.1016/j.tsf.2007.06.185 ◽

2008 ◽

Vol 516 (5) ◽

pp. 687-690 ◽

Cited By ~ 26

Author(s):

Hiroaki Yasuoka ◽

Masahiro Yoshida ◽

Ken Sugita ◽

Keisuke Ohdaira ◽

Hideyuki Murata ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition

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Growth of gallium oxide thin films on silicon by the metal organic chemical vapor deposition method

Materials Science and Engineering B ◽

10.1016/j.mseb.2004.01.012 ◽

2004 ◽

Vol 110 (1) ◽

pp. 34-37 ◽

Cited By ~ 47

Author(s):

Hyoun Woo Kim ◽

Nam Ho Kim

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Gallium Oxide ◽

Chemical Vapor ◽

Organic Chemical ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Metal Organic ◽

Organic Chemical Vapor Deposition

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Effect of Template on the Structure of Carbon Nanotubes Grown by Catalytic Chemical Vapor Deposition Method

Modern Chemistry & Applications ◽

10.4172/2329-6798.1000207 ◽

2017 ◽

Vol 05 (02) ◽

Author(s):

Hekmat F ◽

Sohrabi B ◽

Rahmanifar MS

Keyword(s):

Carbon Nanotubes ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition ◽

Structure Of Carbon Nanotubes

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Microstructure and Optical Properties of Al[sub x]Ga[sub 1−x]N∕GaN Heterostructure Thin Films Grown on Si(111) Substrate by Plasma Assisted Metalorganic Chemical Vapor Deposition Method

10.1063/1.2906048 ◽

2008 ◽

Author(s):

H. Sutanto ◽

A. Subagio ◽

E. Supriyanto ◽

P. Arifin ◽

M. Budiman ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Metalorganic Chemical Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Gan Heterostructure ◽

Metalorganic Chemical

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Preparation of yttrium iron garnet thin films by mist chemical vapor deposition method and their magneto-optical properties

Japanese Journal of Applied Physics ◽

10.7567/jjap.53.05fb17 ◽

2014 ◽

Vol 53 (5S1) ◽

pp. 05FB17 ◽

Cited By ~ 7

Author(s):

Situ Yao ◽

Takashi Sato ◽

Kentaro Kaneko ◽

Shunsuke Murai ◽

Koji Fujita ◽

...

Keyword(s):

Thin Films ◽

Optical Properties ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Yttrium Iron Garnet ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Yttrium Iron ◽

Iron Garnet

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Preparation of SrBi2Ta2O9 Ferroelectric Thin Films by Liquid Source Misted Chemical Vapor Deposition Method Using Inorganic Salt Solution

High-Performance Ceramics III - Key Engineering Materials ◽

10.4028/0-87849-959-8.853 ◽

2007 ◽

pp. 853-856

Author(s):

Hui Ming Ji ◽

Yan Fei Gu ◽

Hui Meng ◽

Ting Xian Xu

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Salt Solution ◽

Vapor Deposition ◽

Inorganic Salt ◽

Chemical Vapor ◽

Ferroelectric Thin Films ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Liquid Source

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Electron emission from diamond thin films deposited by microwave plasma-chemical vapor deposition method

Diamond and Related Materials ◽

10.1016/s0925-9635(00)00325-3 ◽

2000 ◽

Vol 9 (9-10) ◽

pp. 1604-1607 ◽

Cited By ~ 5

Author(s):

Changzhi Gu ◽

Zengsun Jin ◽

Yuguang Wang ◽

Wencheng Jin ◽

Hong Ji ◽

...

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Electron Emission ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Study on catalytic chemical vapor deposition method to prepare hydrogenated amorphous silicon

Journal of Applied Physics ◽

10.1063/1.343278 ◽

1989 ◽

Vol 65 (11) ◽

pp. 4396-4402 ◽

Cited By ~ 109

Author(s):

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Preparation of (Tl, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.33.l840 ◽

1994 ◽

Vol 33 (Part 2, No. 6B) ◽

pp. L840-L842 ◽

Cited By ~ 5

Author(s):

Naoyuki Takahashi ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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Microstructure of Polysilicon Films Grown by Catalytic Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.37.92 ◽

1998 ◽

Vol 37 (Part 1, No. 1) ◽

pp. 92-93 ◽

Cited By ~ 8

Author(s):

An-Qiang He ◽

Akira Heya ◽

Nobuo Otsuka ◽

Hideki Matsumura

Keyword(s):

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Deposition Method ◽

Catalytic Chemical Vapor Deposition ◽

Polysilicon Films

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Preparation of (Bi, Pb)-Sr-Ca-Cu-O Superconducting Thin Films by the Mist Microwave-Plasma Chemical Vapor Deposition Method

Japanese Journal of Applied Physics ◽

10.1143/jjap.32.l1648 ◽

1993 ◽

Vol 32 (Part 2, No. 11B) ◽

pp. L1648-L1650 ◽

Cited By ~ 11

Author(s):

Naoyuki Takahashi ◽

Daigorou Kanematsu ◽

Akinori Koukitu ◽

Hisashi Seki ◽

Yasuharu Kamioka

Keyword(s):

Thin Films ◽

Chemical Vapor Deposition ◽

Vapor Deposition ◽

Microwave Plasma ◽

Chemical Vapor ◽

Chemical Vapor Deposition Method ◽

Superconducting Thin Films ◽

Deposition Method ◽

Plasma Chemical ◽

Plasma Chemical Vapor Deposition

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