Temperature dependence of the microstructure and resistivity of indium zinc oxide films deposited by direct current magnetron reactive sputtering

2008 ◽  
Vol 516 (8) ◽  
pp. 2045-2049 ◽  
Author(s):  
Do-Geun Kim ◽  
Sunghun Lee ◽  
Dong-Ho Kim ◽  
Gun-Hwan Lee ◽  
Minoru Isshiki
Keyword(s):  
Zinc Oxide ◽  
Temperature Dependence ◽  
Direct Current ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Zinc Oxide Films ◽  
Indium Zinc Oxide

scholarly journals Study on the deposition of aluminum-doped zinc oxide films using direct-current pulse magnetron reactive sputtering technique

2012 ◽  
Vol 61 (3) ◽  
pp. 036104
Author(s):  
Chen Chao ◽  
Ji Yong ◽  
Gao Xiao-Yong ◽  
Zhao Meng-Ke ◽  
Ma Jiao-Min ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Current Pulse ◽  
Direct Current ◽  
Oxide Films ◽  
Reactive Sputtering ◽  
Zinc Oxide Films ◽  
Pulse Magnetron ◽  
Aluminum Doped Zinc Oxide

Physical properties and growth kinetics of co-sputtered indium-zinc oxide films

2009 ◽  
Vol 24 (9) ◽  
pp. 095019 ◽  
Author(s):  
Changgang Huang ◽  
Meili Wang ◽  
Quanlin Liu ◽  
Yongge Cao ◽  
Zhonghua Deng ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Physical Properties ◽  
Growth Kinetics ◽  
Oxide Films ◽  
Zinc Oxide Films ◽  
Indium Zinc Oxide ◽  
Kinetics Of

Advantages of using amorphous indium zinc oxide films for window layer in Cu(In,Ga)Se2 solar cells

2012 ◽  
Vol 520 (6) ◽  
pp. 2119-2122 ◽  
Author(s):  
Moe Warasawa ◽  
Akira Kaijo ◽  
Mutsumi Sugiyama
Keyword(s):  
Zinc Oxide ◽  
Solar Cells ◽  
Oxide Films ◽  
Window Layer ◽  
Zinc Oxide Films ◽  
Indium Zinc Oxide

Structure and Internal Stress of Tin-Doped Indium Oxide and Indium–Zinc Oxide Films Deposited by DC Magnetron Sputtering

2007 ◽  
Vol 46 (12) ◽  
pp. 7806-7811 ◽  
Author(s):  
Eriko Nishimura ◽  
Tomoko Sasabayashi ◽  
Norihiro Ito ◽  
Yasushi Sato ◽  
Kentaro Utsumi ◽  
...  
Keyword(s):  
Zinc Oxide ◽  
Magnetron Sputtering ◽  
Internal Stress ◽  
Indium Oxide ◽  
Oxide Films ◽  
Dc Magnetron Sputtering ◽  
Zinc Oxide Films ◽  
Indium Zinc Oxide
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