Optical properties of aluminum-doped zinc oxide films deposited by direct-current pulse magnetron reactive sputtering

Chinese Physics B ◽

10.1088/1674-1056/23/3/030701 ◽

2014 ◽

Vol 23 (3) ◽

pp. 030701 ◽

Author(s):

Xiao-Yong Gao ◽

Chao Chen ◽

Sa Zhang

Keyword(s):

Optical Properties ◽

Current Pulse ◽

Direct Current ◽

Oxide Films ◽

Reactive Sputtering ◽

Zinc Oxide Films ◽

Pulse Magnetron ◽

Aluminum Doped Zinc Oxide

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Study on the deposition of aluminum-doped zinc oxide films using direct-current pulse magnetron reactive sputtering technique

Acta Physica Sinica ◽

10.7498/aps.61.036104 ◽

2012 ◽

Vol 61 (3) ◽

pp. 036104

Author(s):

Chen Chao ◽

Ji Yong ◽

Gao Xiao-Yong ◽

Zhao Meng-Ke ◽

Ma Jiao-Min ◽

...

Keyword(s):

Current Pulse ◽

Direct Current ◽

Oxide Films ◽

Reactive Sputtering ◽

Zinc Oxide Films ◽

Pulse Magnetron ◽

Aluminum Doped Zinc Oxide

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Study on the structural, electrical, and optical properties of aluminum-doped zinc oxide films by direct current pulse reactive magnetron sputtering

Thin Solid Films ◽

10.1016/j.tsf.2009.02.133 ◽

2009 ◽

Vol 517 (16) ◽

pp. 4684-4688 ◽

Author(s):

Gao Xiao-Yong ◽

Lin Qing-Geng ◽

Feng Hong-Liang ◽

Liu Yu-Fen ◽

Lu Jing-Xiao

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Current Pulse ◽

Direct Current ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Electrical And Optical Properties ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Comparable study on the effect of diluted NH4Cl solution on the postdeposition surface texture of as-deposited aluminum-doped zinc oxide films by direct current pulse and direct current reactive magnetron sputtering

Applied Surface Science ◽

10.1016/j.apsusc.2009.03.080 ◽

2009 ◽

Vol 255 (16) ◽

pp. 7268-7272 ◽

Author(s):

Xiaoyong Gao ◽

Qinggeng Lin ◽

Hongliang Feng ◽

Yongsheng Chen ◽

Shie Yang ◽

...

Keyword(s):

Magnetron Sputtering ◽

Current Pulse ◽

Direct Current ◽

Surface Texture ◽

Reactive Magnetron Sputtering ◽

Reactive Magnetron ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide ◽

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Substrate temperature dependence of growth mode, microstructure and optical properties of highly oriented zinc oxide films deposited by reactive sputtering

Thin Solid Films ◽

10.1016/j.tsf.2008.07.040 ◽

2008 ◽

Vol 517 (2) ◽

pp. 661-669 ◽

Author(s):

Sukhvinder Singh ◽

Tapas Ganguli ◽

Ravi Kumar ◽

R.S. Srinivasa ◽

S.S. Major

Keyword(s):

Optical Properties ◽

Substrate Temperature ◽

Temperature Dependence ◽

Oxide Films ◽

Reactive Sputtering ◽

Growth Mode ◽

Zinc Oxide Films

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Structural, electrical and optical properties of aluminum doped zinc oxide films prepared by radio frequency magnetron sputtering

Journal of Applied Physics ◽

10.1063/1.365556 ◽

1997 ◽

Vol 81 (12) ◽

pp. 7764-7772 ◽

Author(s):

Kun Ho Kim ◽

Ki Cheol Park ◽

Dae Young Ma

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Radio Frequency ◽

Oxide Films ◽

Radio Frequency Magnetron ◽

Radio Frequency Magnetron Sputtering ◽

Electrical And Optical Properties ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Erratum: “Structural, electrical and optical properties of aluminum doped zinc oxide films prepared by rf magnetron sputtering” [J. Appl. Phys. 81, 7764 (1997)]

Journal of Applied Physics ◽

10.1063/1.368071 ◽

1998 ◽

Vol 84 (1) ◽

pp. 660-660

Author(s):

Kun Ho Kim ◽

Ki Cheol Park ◽

Dae Young Ma

Keyword(s):

Optical Properties ◽

Magnetron Sputtering ◽

Oxide Films ◽

Rf Magnetron Sputtering ◽

Electrical And Optical Properties ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Temperature dependence of the microstructure and resistivity of indium zinc oxide films deposited by direct current magnetron reactive sputtering

Thin Solid Films ◽

10.1016/j.tsf.2007.07.181 ◽

2008 ◽

Vol 516 (8) ◽

pp. 2045-2049 ◽

Author(s):

Do-Geun Kim ◽

Sunghun Lee ◽

Dong-Ho Kim ◽

Gun-Hwan Lee ◽

Minoru Isshiki

Keyword(s):

Temperature Dependence ◽

Direct Current ◽

Oxide Films ◽

Reactive Sputtering ◽

Zinc Oxide Films ◽

Indium Zinc Oxide

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Preparation of aluminum doped zinc oxide films and the study of their microstructure, electrical and optical properties

Thin Solid Films ◽

10.1016/j.tsf.2007.01.041 ◽

2007 ◽

Vol 515 (17) ◽

pp. 6909-6914 ◽

Author(s):

Hong-ming Zhou ◽

Dan-qing Yi ◽

Zhi-ming Yu ◽

Lai-rong Xiao ◽

Jian Li

Keyword(s):

Optical Properties ◽

Oxide Films ◽

Electrical And Optical Properties ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide

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Comparison of the electrical and optical properties of direct current and radio frequency sputtered amorphous indium gallium zinc oxide films

Thin Solid Films ◽

10.1016/j.tsf.2012.12.035 ◽

2013 ◽

Vol 527 ◽

pp. 21-25 ◽

Author(s):

Jianke Yao ◽

Li Gong ◽

Lei Xie ◽

Shengdong Zhang

Keyword(s):

Optical Properties ◽

Radio Frequency ◽

Direct Current ◽

Oxide Films ◽

Indium Gallium Zinc Oxide ◽

Electrical And Optical Properties ◽

Zinc Oxide Films ◽

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Microwave hydrogen plasma annealing to improve electrical and optical properties of aluminum doped zinc oxide films

2011 6th International Microsystems, Packaging, Assembly and Circuits Technology Conference (IMPACT) ◽

10.1109/impact.2011.6117210 ◽

2011 ◽

Author(s):

Shang-Chou Chang ◽

To-Sing Li ◽

Bo-You Chen ◽

Tien-Chai Lin

Keyword(s):

Optical Properties ◽

Hydrogen Plasma ◽

Oxide Films ◽

Electrical And Optical Properties ◽

Zinc Oxide Films ◽

Aluminum Doped Zinc Oxide ◽

Plasma Annealing

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