Characterization of pulsed laser deposited hydrogenated amorphous silicon films by spectroscopic ellipsometry

Thin Solid Films ◽

10.1016/j.tsf.2010.12.173 ◽

2011 ◽

Vol 519 (9) ◽

pp. 2855-2858 ◽

Author(s):

István Hanyecz ◽

Judit Budai ◽

Edit Szilágyi ◽

Zsolt Tóth

Keyword(s):

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Hydrogenated Amorphous Silicon ◽

Pulsed Laser ◽

Silicon Films ◽

Hydrogenated Amorphous

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Optical Characterization of Very Thin Hydrogenated Amorphous Silicon Films Using Spectroscopic Ellipsometry

Japanese Journal of Applied Physics ◽

10.1143/jjap.30.l1914 ◽

1991 ◽

Vol 30 (Part 2, No. 11B) ◽

pp. L1914-L1916 ◽

Author(s):

Tadashi Saitoh ◽

Nobuyasu Hori ◽

Katsuyuki Suzuki ◽

Shigeo Iida

Keyword(s):

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Hydrogenated Amorphous Silicon ◽

Optical Characterization ◽

Silicon Films ◽

Hydrogenated Amorphous

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Fabrication and characterization of hydrogenated amorphous silicon films, CVD diamond films, and their devices

10.31274/rtd-180813-12799 ◽

1994 ◽

Author(s):

Hao Jia

Keyword(s):

Amorphous Silicon ◽

Diamond Films ◽

Hydrogenated Amorphous Silicon ◽

Cvd Diamond ◽

Silicon Films ◽

Fabrication And Characterization ◽

Hydrogenated Amorphous

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Preparation and characterization of hydrogenated amorphous-silicon films produced by ion plating and hydrogenated amorphous-boron films produced by glow-discharge decomposition. Final report, April 1, 1980-May 31, 1981

10.2172/5962055 ◽

1981 ◽

Author(s):

F. Cocks ◽

P. Jones

Keyword(s):

Glow Discharge ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Final Report ◽

Amorphous Boron ◽

Ion Plating ◽

Hydrogenated Amorphous

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Crystallization of hydrogenated amorphous silicon films by exposure to femtosecond pulsed laser radiation

Semiconductors ◽

10.1134/s1063782611020254 ◽

2011 ◽

Vol 45 (2) ◽

pp. 265-270 ◽

Author(s):

V. A. Volodin ◽

A. S. Kachko

Keyword(s):

Laser Radiation ◽

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Pulsed Laser ◽

Silicon Films ◽

Pulsed Laser Radiation ◽

Hydrogenated Amorphous ◽

Femtosecond Pulsed Laser

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Physical characterization of halogenated and hydrogenated amorphous silicon films

Thin Solid Films ◽

10.1016/0040-6090(80)90582-9 ◽

1980 ◽

Vol 69 (3) ◽

pp. 315-320 ◽

Author(s):

V. Augelli ◽

R. Murri ◽

S. Galassini ◽

A. Tepore

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Physical Characterization ◽

Hydrogenated Amorphous

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Spectroscopic Ellipsometry Characterization of Hydrogenated Amorphous Silicon Thin Film

Acta Optica Sinica ◽

10.3788/aos201333.1031001 ◽

2013 ◽

Vol 33 (10) ◽

pp. 1031001

Author(s):

何剑 He Jian ◽

李伟 Li Wei ◽

徐睿 Xu Rui ◽

郭安然 Guo Anran ◽

祁康成 Qi Kangcheng ◽

...

Keyword(s):

Thin Film ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Hydrogenated Amorphous Silicon ◽

Silicon Thin Film ◽

Hydrogenated Amorphous

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Kinetics of defect creation by pulsed laser illumination in hydrogenated amorphous silicon films deposited from pure silane and from silane-helium mixtures

Journal of Non-Crystalline Solids ◽

10.1016/0022-3093(93)90523-z ◽

1993 ◽

Vol 164-166 ◽

pp. 191-194 ◽

Author(s):

S. Vignoli ◽

R. Meaudre ◽

M. Meaudre ◽

L. Chanel ◽

P. Roca i Cabarrocas

Keyword(s):

Amorphous Silicon ◽

Hydrogenated Amorphous Silicon ◽

Pulsed Laser ◽

Silicon Films ◽

Helium Mixtures ◽

Laser Illumination ◽

Defect Creation ◽

Hydrogenated Amorphous ◽

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Spectroscopic Ellipsometry for the Identification of Paracrystallites in the Ultra-Thin Thermal CVD Hydrogenated Amorphous Silicon Films

10.7567/ssdm.2000.lb-2-1 ◽

2000 ◽

Author(s):

Sukti Hazra ◽

Isao Sakata ◽

Mitsuyuki Yamanaka ◽

Eiichi Suzuki

Keyword(s):

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Hydrogenated Amorphous Silicon ◽

Silicon Films ◽

Thermal Cvd ◽

Hydrogenated Amorphous

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Spectroscopic Ellipsometry Studies on Ultrathin Hydrogenated Amorphous Silicon Films Prepared by Thermal Chemical Vapor Deposition

Japanese Journal of Applied Physics ◽

10.1143/jjap.39.6196 ◽

2000 ◽

Vol 39 (Part 1, No. 11) ◽

pp. 6196-6201 ◽

Author(s):

Sukti Hazra ◽

Mitsuyuki Yamanaka ◽

Isao Sakata ◽

Toshiyuki Tsutsumi ◽

Tatsuro Maeda ◽

...

Keyword(s):

Chemical Vapor Deposition ◽

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Vapor Deposition ◽

Hydrogenated Amorphous Silicon ◽

Chemical Vapor ◽

Silicon Films ◽

Thermal Chemical Vapor Deposition ◽

Hydrogenated Amorphous

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Complete optical characterization of imperfect hydrogenated amorphous silicon layers by spectroscopic ellipsometry and spectroscopic reflectometry

Thin Solid Films ◽

10.1016/s0040-6090(98)01586-7 ◽

1999 ◽

Vol 343-344 ◽

pp. 295-298 ◽

Author(s):

D. Franta ◽

I. Ohlídal ◽

D. Munzar ◽

J. Hora ◽

K. Navrátil ◽

...

Keyword(s):

Amorphous Silicon ◽

Spectroscopic Ellipsometry ◽

Hydrogenated Amorphous Silicon ◽

Optical Characterization ◽

Spectroscopic Reflectometry ◽

Hydrogenated Amorphous

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