High-performance polycrystalline silicon thin-film transistors prepared via the laser crystallization of the prepatterned channel layer on the bottom-gate structure

Thin Solid Films ◽

10.1016/j.tsf.2012.09.048 ◽

2013 ◽

Vol 529 ◽

pp. 421-425 ◽

Author(s):

Chao-Lung Wang ◽

I-Che Lee ◽

Chun-Yu Wu ◽

Yu-Ting Cheng ◽

Po-Yu Yang ◽

...

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Laser Crystallization ◽

Silicon Thin Film ◽

Channel Layer ◽

Gate Structure ◽

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High-performance vertically stacked bottom-gate and top-gate polycrystalline silicon thin-film transistors for three-dimensional integrated circuits

Solid-State Electronics ◽

10.1016/j.sse.2012.05.016 ◽

2012 ◽

Vol 77 ◽

pp. 26-30 ◽

Author(s):

I-Che Lee ◽

Tsung-Che Tsai ◽

Chun-Chien Tsai ◽

Po-Yu Yang ◽

Chao-Lung Wang ◽

...

Keyword(s):

Thin Film ◽

Integrated Circuits ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Three Dimensional ◽

Silicon Thin Film ◽

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High-Performance Low Temperature Poly-Silicon Thin Film Transistors Fabricated by Excimer Laser Irradiation with Bottom-Gate Structure

ECS Meeting Abstracts ◽

10.1149/ma2006-02/33/1587 ◽

2006 ◽

Keyword(s):

Thin Film ◽

Low Temperature ◽

Laser Irradiation ◽

Excimer Laser ◽

Thin Film Transistors ◽

High Performance ◽

Silicon Thin Film ◽

Gate Structure ◽

Excimer Laser Irradiation ◽

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High-Performance Self-Aligned Bottom-Gate Low-Temperature Poly-Silicon Thin-Film Transistors With Excimer Laser Crystallization

IEEE Electron Device Letters ◽

10.1109/led.2007.899326 ◽

2007 ◽

Vol 28 (7) ◽

pp. 599-602 ◽

Author(s):

Chun-Chien Tsai ◽

Hsu-Hsin Chen ◽

Bo-Ting Chen ◽

Huang-Chung Cheng

Keyword(s):

Thin Film ◽

Low Temperature ◽

Excimer Laser ◽

Thin Film Transistors ◽

High Performance ◽

Laser Crystallization ◽

Silicon Thin Film ◽

Poly Silicon ◽

Excimer Laser Crystallization ◽

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High-Performance Polycrystalline Silicon Thin-Film Transistors with Two-Dimensional Location Control of the Grain Boundary via Excimer Laser Crystallization

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2012.6308 ◽

2012 ◽

Vol 12 (7) ◽

pp. 5505-5509 ◽

Author(s):

Chao-Lung Wang ◽

I.-Che Lee ◽

Chun-Yu Wu ◽

Chan-Yu Liao ◽

Yu-Ting Cheng ◽

...

Keyword(s):

Thin Film ◽

Grain Boundary ◽

Excimer Laser ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Two Dimensional ◽

Laser Crystallization ◽

Silicon Thin Film ◽

Excimer Laser Crystallization

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SiO2formation by thermal evaporation of SiO in oxygen atmosphere used to fabrication of high performance polycrystalline silicon thin film transistors

Applied Physics Letters ◽

10.1063/1.110956 ◽

1994 ◽

Vol 64 (8) ◽

pp. 1018-1020 ◽

Author(s):

T. Sameshima ◽

A. Kohno ◽

M. Sekiya ◽

M. Hara ◽

N. Sano

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Thermal Evaporation ◽

Oxygen Atmosphere ◽

Silicon Thin Film

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Development of high-performance polycrystalline silicon thin-film transistors (TFTs) using defect control process technologies

IEEE Electron Device Letters ◽

10.1109/led.2002.1015218 ◽

2002 ◽

Vol 23 (7) ◽

pp. 407-409 ◽

Author(s):

S. Higashi ◽

D. Abe ◽

Y. Hiroshima ◽

K. Miyashita ◽

T. Kawamura ◽

...

Keyword(s):

Thin Film ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Control Process ◽

Silicon Thin Film ◽

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The Characteristics of Hot-Carrier Stressed Bottom-Gate Polycrystalline Silicon Thin-Film Transistors Employing Alternating Magnetic-Field-Enhanced Rapid Thermal Annealing

ECS Meeting Abstracts ◽

10.1149/ma2008-02/35/2266 ◽

2008 ◽

Keyword(s):

Magnetic Field ◽

Thin Film ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Alternating Magnetic Field ◽

Silicon Thin Film ◽

Hot Carrier ◽

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High-Performance Polycrystalline-Silicon Nanowire Thin-Film Transistors With Location-Controlled Grain Boundary via Excimer Laser Crystallization

IEEE Electron Device Letters ◽

10.1109/led.2012.2211857 ◽

2012 ◽

Vol 33 (11) ◽

pp. 1562-1564 ◽

Author(s):

Chao-Lung Wang ◽

I-Che Lee ◽

Chun-Yu Wu ◽

Chia-Hsin Chou ◽

Po-Yu Yang ◽

...

Keyword(s):

Thin Film ◽

Grain Boundary ◽

Excimer Laser ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

High Performance ◽

Silicon Nanowire ◽

Laser Crystallization ◽

Excimer Laser Crystallization

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The Characteristics of Hot-Carrier Stressed Bottom-Gate Polycrystalline Silicon Thin-Film Transistors Employing Alternating Magnetic-Field-Enhanced Rapid Thermal Annealing

ECS Transactions ◽

10.1149/1.2980532 ◽

2019 ◽

Vol 16 (9) ◽

pp. 67-72

Author(s):

Won-Kyu Lee ◽

Hee-Sun Shin ◽

Kyusik Cho ◽

Joonhoo Choi ◽

Chi-Woo Kim ◽

...

Keyword(s):

Magnetic Field ◽

Thin Film ◽

Thermal Annealing ◽

Rapid Thermal Annealing ◽

Thin Film Transistors ◽

Polycrystalline Silicon ◽

Alternating Magnetic Field ◽

Silicon Thin Film ◽

Hot Carrier ◽

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High-Performance Bottom-Gate Poly-Si Polysilicon–Oxide–Nitride–Oxide–Silicon Thin Film Transistors Crystallized by Excimer Laser Irradiation for Two-Bit Nonvolatile Memory Applications

Journal of Nanoscience and Nanotechnology ◽

10.1166/jnn.2012.6245 ◽

2012 ◽

Vol 12 (7) ◽

pp. 5318-5324 ◽

Author(s):

I-Che Lee ◽

Hsu-Hang Kuo ◽

Chun-Chien Tsai ◽

Chao-Lung Wang ◽

Po-Yu Yang ◽

...

Keyword(s):

Thin Film ◽

Laser Irradiation ◽

Thin Film Transistors ◽

Nonvolatile Memory ◽

High Performance ◽

Silicon Thin Film ◽

Excimer Laser Irradiation ◽

Memory Applications ◽

Nitride Oxide ◽

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