Atomic layer deposition of high-quality Al2O3 and Al-doped TiO2 thin films from hydrogen-free precursors

2014 ◽  
Vol 565 ◽  
pp. 19-24 ◽  
Author(s):  
Lauri Aarik ◽  
Tõnis Arroval ◽  
Raul Rammula ◽  
Hugo Mändar ◽  
Väino Sammelselg ◽  
...  
Author(s):  
Dohyun Go ◽  
Jaehyeong Lee ◽  
Jeong Woo Shin ◽  
Sungje Lee ◽  
Wangu Kang ◽  
...  

2020 ◽  
Vol 32 (4) ◽  
pp. 1393-1407
Author(s):  
Maxime E. Dufond ◽  
Maïmouna W. Diouf ◽  
Clémence Badie ◽  
Carine Laffon ◽  
Philippe Parent ◽  
...  

2008 ◽  
Vol 354 (2-9) ◽  
pp. 404-408 ◽  
Author(s):  
S. Dueñas ◽  
H. Castán ◽  
H. García ◽  
L. Bailón ◽  
K. Kukli ◽  
...  

2009 ◽  
Vol 91 (3-4) ◽  
pp. 628-633 ◽  
Author(s):  
Chang-Soo Lee ◽  
Jungwon Kim ◽  
J.Y. Son ◽  
Wonyong Choi ◽  
Hyungjun Kim

Langmuir ◽  
2014 ◽  
Vol 30 (25) ◽  
pp. 7395-7404 ◽  
Author(s):  
Mikko Kaipio ◽  
Timothee Blanquart ◽  
Yoann Tomczak ◽  
Jaakko Niinistö ◽  
Marco Gavagnin ◽  
...  

2005 ◽  
Vol 285 (1-2) ◽  
pp. 208-214 ◽  
Author(s):  
D.R.G. Mitchell ◽  
D.J. Attard ◽  
G. Triani

Sign in / Sign up

Export Citation Format

Share Document