Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering

2018 ◽  
Vol 660 ◽  
pp. 601-605 ◽  
Author(s):  
Tae Hyung Kim ◽  
Soo Jung Lee ◽  
Do Han Kim ◽  
Dong Woo Kim ◽  
Jeong Woon Bae ◽  
...  
Keyword(s):  
Residual Stress ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Stress Control ◽  
Cu Film ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

Effect of NaOH solution on surface textured ZnO: Al films prepared by pulsed direct current magnetron sputtering

2012 ◽  
Vol 15 (5) ◽  
pp. 555-558 ◽  
Author(s):  
Ying Wang ◽  
Hualin Wang ◽  
Chaoqian Liu ◽  
Yun Wang ◽  
Shou Peng ◽  
...  
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
Naoh Solution ◽  
Pulsed Direct Current

Fluorine-doped tin oxide films grown by pulsed direct current magnetron sputtering with an Sn target

2010 ◽  
Vol 50 (9) ◽  
pp. C106 ◽  
Author(s):  
Bo-Huei Liao ◽  
Chien-Cheng Kuo ◽  
Pin-Jen Chen ◽  
Cheng-Chung Lee
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Tin Oxide ◽  
Oxide Films ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current ◽  
Tin Oxide Films

The properties of TiN thin films deposited by pulsed direct current magnetron sputtering

2008 ◽  
Vol 516 (21) ◽  
pp. 7294-7298 ◽  
Author(s):  
Tung-Sheng Yeh ◽  
Jenn-Ming Wu ◽  
Long-Jang Hu
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
Tin Thin Films ◽  
Pulsed Direct Current

Microstructural evolution of thin film vanadium oxide prepared by pulsed-direct current magnetron sputtering

2012 ◽  
Vol 112 (9) ◽  
pp. 093504 ◽  
Author(s):  
M. A. Motyka ◽  
B. D. Gauntt ◽  
M. W. Horn ◽  
E. C. Dickey ◽  
N. J. Podraza
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Microstructural Evolution ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

Effect of process conditions on the optoelectronic characteristics of ZnO:Mo thin films prepared by pulsed direct current magnetron sputtering

2010 ◽  
Vol 518 (17) ◽  
pp. 4928-4934 ◽  
Author(s):  
Y.C. Lin ◽  
B.L. Wang ◽  
W.T. Yen ◽  
C.T. Ha ◽  
Chris Peng
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Process Conditions ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

scholarly journals Development of Zirconium Thin Films by Pulsed Direct Current Magnetron Sputtering: Effect of Pulsed Parameters

2014 ◽  
Vol 8 (1) ◽  
pp. 5-14 ◽  
Author(s):  
Akash Singh ◽  
P Kuppusami ◽  
R Thirumurugesan ◽  
V Ganesan ◽  
E Mohandas
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

scholarly journals Dielectric breakdown of alumina thin films produced by pulsed direct current magnetron sputtering

2018 ◽  
Vol 662 ◽  
pp. 145-154 ◽  
Author(s):  
Benjamin V.T. Hanby ◽  
Bryan W. Stuart ◽  
Colin Grant ◽  
Jonathan Moffat ◽  
Jonathan Blissett ◽  
...  
Keyword(s):  
Thin Films ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Dielectric Breakdown ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current
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