Fluorine-doped tin oxide films grown by pulsed direct current magnetron sputtering with an Sn target

2010 ◽  
Vol 50 (9) ◽  
pp. C106 ◽  
Author(s):  
Bo-Huei Liao ◽  
Chien-Cheng Kuo ◽  
Pin-Jen Chen ◽  
Cheng-Chung Lee
Keyword(s):  
Magnetron Sputtering ◽  
Direct Current ◽  
Tin Oxide ◽  
Oxide Films ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current ◽  
Tin Oxide Films

scholarly journals Pulsed direct current magnetron sputtered nanocrystalline tin oxide films

2012 ◽  
Vol 258 (22) ◽  
pp. 8902-8907 ◽  
Author(s):  
A. Sivasankar Reddy ◽  
N.M. Figueiredo ◽  
A. Cavaleiro
Keyword(s):  
Direct Current ◽  
Tin Oxide ◽  
Oxide Films ◽  
Pulsed Direct Current ◽  
Tin Oxide Films

Characteristics of Indium Tin Oxide Films Deposited by DC and RF Magnetron Sputtering

2001 ◽  
Vol 40 (Part 1, No. 5A) ◽  
pp. 3364-3369 ◽  
Author(s):  
Wenli Deng ◽  
Taizo Ohgi ◽  
Hitoshi Nejo ◽  
Daisuke Fujita
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Rf Magnetron Sputtering ◽  
Tin Oxide Films

Preparation and characterization of tantalum-doped indium tin oxide films deposited by magnetron sputtering

2008 ◽  
Vol 58 (3) ◽  
pp. 203-206 ◽  
Author(s):  
Bo Zhang ◽  
Xianping Dong ◽  
Xiaofeng Xu ◽  
Jiansheng Wu
Keyword(s):  
Magnetron Sputtering ◽  
Tin Oxide ◽  
Indium Tin Oxide ◽  
Oxide Films ◽  
Tin Oxide Films
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