Microstructural evolution of thin film vanadium oxide prepared by pulsed-direct current magnetron sputtering

2012 ◽  
Vol 112 (9) ◽  
pp. 093504 ◽  
Author(s):  
M. A. Motyka ◽  
B. D. Gauntt ◽  
M. W. Horn ◽  
E. C. Dickey ◽  
N. J. Podraza
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Vanadium Oxide ◽  
Microstructural Evolution ◽  
Direct Current ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

scholarly journals High rate deposition of thin film cadmium sulphide by pulsed direct current magnetron sputtering

2015 ◽  
Vol 574 ◽  
pp. 43-51 ◽  
Author(s):  
F. Lisco ◽  
P.M. Kaminski ◽  
A. Abbas ◽  
J.W. Bowers ◽  
G. Claudio ◽  
...  
Keyword(s):  
Thin Film ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Cadmium Sulphide ◽  
High Rate ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current

ZrCuAlNi thin film metallic glass grown by high power impulse and direct current magnetron sputtering

2021 ◽  
pp. 127029
Author(s):  
Niklas Bönninghoff ◽  
Wahyu Diyatmika ◽  
Jinn P. Chu ◽  
Stanislav Mráz ◽  
Jochen M. Schneider ◽  
...  
Keyword(s):  
Thin Film ◽  
Metallic Glass ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
High Power ◽  
Direct Current Magnetron Sputtering

Residual stress control of Cu film deposited using a pulsed direct current magnetron sputtering

2018 ◽  
Vol 660 ◽  
pp. 601-605 ◽  
Author(s):  
Tae Hyung Kim ◽  
Soo Jung Lee ◽  
Do Han Kim ◽  
Dong Woo Kim ◽  
Jeong Woon Bae ◽  
...  
Keyword(s):  
Residual Stress ◽  
Magnetron Sputtering ◽  
Direct Current ◽  
Stress Control ◽  
Cu Film ◽  
Direct Current Magnetron Sputtering ◽  
Pulsed Direct Current
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