Role of the deposition parameters in the uniformity of films produced by the plasma-enhanced chemical vapour deposition technique
1997 ◽
Vol 76
(3)
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pp. 259-272
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2011 ◽
Vol 6
(11)
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pp. 1270-1279
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2013 ◽
Vol 140
(1)
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pp. 37-41
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2013 ◽
Vol 686
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pp. 325-330
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2015 ◽
Vol 328
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pp. 146-153
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2011 ◽
Vol 257
(7)
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pp. 2940-2943
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