scholarly journals p+ polycrystalline silicon growth via hot wire chemical vapour deposition for silicon solar cells

2020 ◽  
Vol 705 ◽  
pp. 137978 ◽  
Author(s):  
Edris Khorani ◽  
Tudor E. Scheul ◽  
Antulio Tarazona ◽  
John Nutter ◽  
Tasmiat Rahman ◽  
...  
2007 ◽  
Vol 989 ◽  
Author(s):  
Hongbo Li ◽  
Ronald H.J. Franken ◽  
Robert L. Stolk ◽  
C. H.M. van der Werf ◽  
Jan-Willem A. Schuttauf ◽  
...  

AbstractThe influence of the surface roughness of Ag/ZnO coated substrates on the AM1.5 J-V characteristics of microcrystalline silicon (μc-Si:H) solar cells with an i-layer made by the hot-wire chemical vapour deposition (HWCVD) technique is discussed. Cells deposited on substrates with an intermediate rms roughness show the highest efficiency. When using reverse hydrogen profiling during i-layer deposition, an efficiency of 8.5 % was reached for single junction μc-Si:H n-i-p cells, which is the highest for μc-Si:H n-i-p cells with a hot-wire i-layer.


2009 ◽  
Vol 517 (12) ◽  
pp. 3575-3577 ◽  
Author(s):  
Fernando Villar ◽  
Aldrin Antony ◽  
Jordi Escarré ◽  
Daniel Ibarz ◽  
Rubén Roldán ◽  
...  

2006 ◽  
Vol 501 (1-2) ◽  
pp. 276-279 ◽  
Author(s):  
H. Li ◽  
R.L. Stolk ◽  
C.H.M. van der Werf ◽  
M.Y.S. Rusche ◽  
J.K. Rath ◽  
...  

2003 ◽  
Vol 430 (1-2) ◽  
pp. 202-207 ◽  
Author(s):  
Stefan Klein ◽  
Friedhelm Finger ◽  
Reinhard Carius ◽  
Thorsten Dylla ◽  
Bernd Rech ◽  
...  

1994 ◽  
Vol 59 (6) ◽  
pp. 645-651 ◽  
Author(s):  
J. Cifre ◽  
J. Bertomeu ◽  
J. Puigdollers ◽  
M. C. Polo ◽  
J. Andreu ◽  
...  

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